Deposition of niobium and zirconium carbides with vapor -gas phase circulation in a closed circuit

Funke, V.F.; Tyutyunnikov, A. I.; Makeev, V. S.; Pilyugin, A. N.; Shevchenko, V. A.

doi:10.1007/bf01117784

Cited by 4 publications

(3 citation statements)

References 1 publication

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“…The carbon sources are CH 4 or a high‐carbon‐content hydrocarbon 8 . The process parameters have also been intensively studied, including the thermodynamics, carbon source effect, zirconium source effect, and hydrogen effect 6,8,11–13 …”

Section: Introductionmentioning

confidence: 99%

Deposition Mechanism for Chemical Vapor Deposition of Zirconium Carbide Coatings

Wang

Liu

et al. 2008

Journal of the American Ceramic Society

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Zirconium carbide (ZrC) coatings were fabricated by chemical vapor deposition (CVD) using ZrCl4, CH4/C3H6, and H2 as precursors. Both thermodynamic calculation results and the film compositions at different temperatures indicated that zirconium and carbon deposited separately during the CVD process. The ZrC deposition rates were measured for CH4 or C3H6 as carbon sources at different temperatures based on coating thickness. The activation energies for ZrC deposition demonstrated that the CVD ZrC process is controlled by the carbon deposition. This is also proven by the morphologies of ZrC coatings.

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Section: Introductionmentioning

confidence: 99%

Deposition Mechanism for Chemical Vapor Deposition of Zirconium Carbide Coatings

Wang

Liu

et al. 2008

Journal of the American Ceramic Society

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“…12,15,17 Thermodynamic studies of the ZrC deposition process have also been carried out in previous studies. 13,18,19 To better control the ZrC deposition process, it is necessary to understand the deposition mechanism. However, the study has seldom been done to elucidate such a mechanism.…”

Section: Introductionmentioning

confidence: 99%

Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition

et al. 2008

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Zirconium carbide films were grown on graphite slices by chemical vapor deposition using methane, zirconium tetrachloride, and hydrogen as precursors. The growth rate of zirconium carbide films as a function of temperature was investigated. The morphologies of these films at different temperatures were also observed by scanning electron microscopy. The results indicated that the deposition of zirconium carbide was dominated by gas nucleation at temperatures below 1523 K, and by surface process at temperatures higher than 1523 K. By comparison of the deposition activation energies for zirconium carbide and deposited carbon, it was determined that the carbon deposition was the controlled process during the growing of zirconium carbide films. The effect of temperatures on the morphologies of zirconium carbide films was also discussed, based on the carbon deposition process.

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“…As with hemicarbide, ordered structures could exist (15) such as -Nb C (16)(17)(18)(19)(20)(21). Niobium carbides can be synthetized by a variety of methods including direct union of the elements at high temperature (22,23) or by self-propagating high-temperature reaction (24,25), carburization of the oxides by carbon (26)(27)(28)(29) or methane-hydrogen mixtures (30)(31)(32), carburization of niobium pentahalide (33)(34)(35)(36)(37)(38). Generally, these syntheses occur at high temperature and lead to materials of low surface area which limit their use in catalysis.…”

Section: Introductionmentioning

confidence: 99%

Preparation and Characterization of Niobium Carbide and Carbonitride

Kim

Bugli

Djéga‐Mariadassou

1999

Journal of Solid State Chemistry

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Deposition of niobium and zirconium carbides with vapor -gas phase circulation in a closed circuit

Cited by 4 publications

References 1 publication

Deposition Mechanism for Chemical Vapor Deposition of Zirconium Carbide Coatings

Deposition Mechanism for Chemical Vapor Deposition of Zirconium Carbide Coatings

Morphologies and growth mechanisms of zirconium carbide films by chemical vapor deposition

Preparation and Characterization of Niobium Carbide and Carbonitride

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