Deposition of Nanostructured Fluoropolymer Films on Silicon Substrates via Plasma Polymerization of Allylpentafluorobenzene

Abstract

Nanostructured fluoropolymer films were deposited via plasma polymerization of allylpentafluorobenzene (APFB) on pristine (native oxide-covered) Si(100) and hydrogen-terminated Si(100) (H−Si) surface. By changing the substrate temperature, radio frequency (RF) power, and system pressure, fluoropolymer films composed of fairly well-defined and uniform nanospheres were deposited. The size and size distribution of the nanospheres in the deposited films was studied by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Under the high RF power (400 W) and high system pressure (800 mTorr), nanoporous fluoropolymer films composed of spheres with mean diameter (D m) on the order of 120 nm and narrow size distribution (standard deviation in diameter, SD ∼ 9 nm) were obtained. The chemical composition and structure of the nanostuctured films were studied by X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF−SIMS), and Fourier transform infrared (FTIR) spectroscopy. The fluoropolymer films were highly hydrophobic in nature and could give rise to surface water contact angles above 150°. Although the morphology of the fluoropolymer films deposited on both types of silicon substrates was similar, chemical interaction at the polymer/H−Si interface had resulted in stronger adhesion of the fluoropolymer film to the silicon substrate.

Magnetic Mesoporous Fluoropolymer Nanospheres from Plasma Processes and Adsorption of Surface‐Functionalized Magnetic Nanoparticles

“…The mesoporous nanospheres were prepared by plasma polymerization and deposition, followed by Ar plasma dry etching of the deposited solid particles, as illustrated schematically in Figure 1a). It is known that solid polymer nano‐/micro‐particles of various sizes can be prepared via plasma polymerization and deposition under controlled glow discharge conditions 12–19. Most of these particles are composed of short and long chain molecules, radicals, and molecular fragments.…”

“…The XPS wide scan spectrum (Figure 4a)) of the solid PP‐HDFA nanospheres (described in Figure 2a)) shows the respective binding energies (BEs) of Si 2p and Si 2s at about 100 and 151 eV, C 1s at about 285 eV, O 1s at about 531 eV, and F 1s at about 685 eV. It is known that high plasma energies can lead to deposition of small particles 8, 19. Hence, a moderate RF power of 200 W was chosen for the preparation of PP‐HDFA nanospheres.…”

Optimized plasma-polymerized fluoropolymer mask for local porous silicon formation

“…The rest of the deposition parameters are maintained constant; the pressure at 100 mTorr, the RF power at 100 W, and the deposition duration at 5 min. 31 During the plasma polymerization process, active sites can be formed on the substrate surface by scission of the H-Si bonds via interactions with radicals and deep-UV light generated in the plasma, thereby leading to a surface-bonded polymer film.…”

“…In general, two methods have been proposed in the literature: (i) an adhesion promoter 30 and/or (ii) a surface-activated substrate. 31,32 The former method was used in previous experiments described in Ref. 27.…”

A novel low k thin film based on plasma-polymerized 1- cyano isoquinoline

“…A number of studies have been conducted in this area. The candidate materials include fluorinated polymers [1][2][3], inorganic-organic hybrids [4,5], poly(silsesquioxane)s [6][7][8], and polyimides [9,10].…”