Deposition of diamondlike carbon films by plasma enhanced chemical vapour deposition

Choi, Seong Soo; Kim, D.W.; Joe, Joseph; Moon, Joonoh; Park, K.C.; Jang, Jae Hoon

doi:10.1016/s0921-5107(96)01948-4

Cited by 7 publications

(1 citation statement)

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“…Diamond-like carbon (DLC) thin films, with a large fraction of tetrahedral (sp 3 ) bonded carbon atoms, are among possible alternative materials for NIL. The sp 3 hybridization confers on DLC thin films excellent mechanical properties such as low friction and wear properties as well as high hardness and chemical inertness [19,20]. As an enhancement, fluorine-doping of DLC thin coatings was explored to improve the release properties of DLC.…”

Section: Introductionmentioning

confidence: 99%

Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

Bossard¹,

Boussey²,

Drogoff³

et al. 2016

Nanotechnology

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Nanoimprint templates made of diamond-like carbon (DLC) and amorphous silicon carbide (SiC) thin films and fluorine-doped associated materials, i.e. F-DLC and F-SiC were investigated in the context of thermal nanoimprint lithography (NIL) with respect to their release properties. Their performances in terms of durability and stability were evaluated and compared to those of conventional silicon or silica molds coated with antisticking molecules applied as a self-assembled monolayer. Plasma-enhanced chemical vapor deposition parameters were firstly tuned to optimize mechanical and structural properties of the DLC and SiC thin films. The impact of the amount of fluorine dopant on the deposited thin films properties was then analyzed. A comparative analysis of DLC, F-DLC as well as SiC and F-SiC molds was then carried out over multiple imprints, performed into poly (methyl methacrylate) (PMMA) thermo-plastic resist. The release properties of un-patterned films were evaluated by the measurement of demolding energies and surface energies, associated with a systematic analysis of the mold surface contamination. These analyses showed that the developed materials behave as intrinsically easy-demolding and contamination-free molds over series of up to 40 imprints. To our knowledge, it is the first time that such a large number of imprints has been considered within an exhaustive comparative study of materials for NIL. Finally, the developed materials went through standard e-beam lithography and plasma etching processes to obtain nanoscale-patterned templates. The replicas of those patterned molds, imprinted into PMMA, were shown to be of high fidelity and good stability after several imprints.

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Section: Introductionmentioning

confidence: 99%