1990
DOI: 10.1117/12.22410
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Deposition methods and process techniques for the fabrication of electrochromic all-solid-state devices

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Cited by 5 publications
(2 citation statements)
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“…at 2 =550nm. Both oftransmittance and colored efficiency are comparable with the results reported by literature 1 for BEV and RFSP. In addition, the deposition rate of reactive flash evaporation is much faster than the BEV and RFSP.…”
Section: Expuument Detailssupporting
confidence: 94%
“…at 2 =550nm. Both oftransmittance and colored efficiency are comparable with the results reported by literature 1 for BEV and RFSP. In addition, the deposition rate of reactive flash evaporation is much faster than the BEV and RFSP.…”
Section: Expuument Detailssupporting
confidence: 94%
“…The model used in this work to fit the experimental data is the amorphous semiconductor dispersion model proposed by Forouhi and Bloomer. In this model, the refractive index and extinction coefficient are given by: (5) There are five parameters in this model: A, B, C, Eg and . All the parameters have physical significance.…”
Section: Ellipsometry Measurementsmentioning
confidence: 99%