1985
DOI: 10.1149/1.2113749
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Deposition and Reflow of Phosphosilicate Glass

Abstract: The chemical vapor deposition (CVD) and reflow of phosphosilicate glass (PSG) have been reviewed. The CVD reaction from silane and phosphine has been simulated by SOLGAS thermochemical calculations. This equilibrium calculation method predicts stoichiometric conversion of silane and phosphine. In comparison to experimental determinations, the calculations underestimate the glass phosphorus content by about 1–3 weight percent. In addition, recent observations that the reflow of PSG is greatly enhanced by the pr… Show more

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Cited by 37 publications
(23 citation statements)
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References 14 publications
(27 reference statements)
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“…Due to electrical shielding [16,18], the van der Waals force is reduced, in our case, by about a factor of two; capillary forces are nullified, and direct hydrogen bonding from particle to surface may be replaced by bonding to free water molecules. This is one reason why surface vibrations having the same amplitudes, as shown in Figures 3(b) and (c), could remove Si02 particles only during steam cleaning; the values of the adhesion forces for Si02 during steam cleaning are also given in Table I.…”
Section: Discussionmentioning
confidence: 75%
“…Due to electrical shielding [16,18], the van der Waals force is reduced, in our case, by about a factor of two; capillary forces are nullified, and direct hydrogen bonding from particle to surface may be replaced by bonding to free water molecules. This is one reason why surface vibrations having the same amplitudes, as shown in Figures 3(b) and (c), could remove Si02 particles only during steam cleaning; the values of the adhesion forces for Si02 during steam cleaning are also given in Table I.…”
Section: Discussionmentioning
confidence: 75%
“…Many studies have been carried out to unravel the interactions that occur in particulate adhesion and removal. [9][10][11][12][13][14][15] Most of them considered either adhesion or removal. In our present article, we do both.…”
Section: Introductionmentioning
confidence: 99%
“…3 Much work has been done to describe adhesion forces between particle and substrate surface. [4][5][6][7] This work has led to the conclusion that van der Waals, capillary, and electrostatic adhesion forces are the major contributors. Chemical bonds at the contact area between the adherents are so far accounted for only qualitatively, 4,5,8,9 although they may play an important role on the silicon surface, because a quantitative treatment of chemical bonds between particle and substrate surface is very difficult.…”
Section: Introductionmentioning
confidence: 99%