Deposition and characterization of zirconium nitride (ZrN) thin films by reactive magnetron sputtering with linear gas ion source and bias voltage

Microstructure and Corrosion Behavior of the Modified Layers Grown In Situ by Plasma Nitriding Technology on the Surface of Zr Metal

“…So far, many methods have been used to prepare ZrN coatings, including magnetron sputtering [14,15], vacuum-arc deposition system [5], hollow cathode ion plating technology (HCD-IP) [16,17], ion beam sputtering [18][19][20] and so on. The previous studies have shown that the partial pressure of N 2 , substrate bias, deposition temperature and doped element can significantly affect the bonding strength between coating and matrix [21], the texture of ZrN coating [22], microstructure, density [23][24][25][26] and its mechanical properties, corrosion resistance, and oxidation resistance [27]. Of course, the preparation of the ZrNmodified layer by nitriding on the surface of the zirconium alloy has also been studied, including high-energy nitrogen ion implantation [25,[28][29][30][31] and plasma nitriding [32][33][34].…”

“…The previous studies have shown that the partial pressure of N 2 , substrate bias, deposition temperature and doped element can significantly affect the bonding strength between coating and matrix [21], the texture of ZrN coating [22], microstructure, density [23][24][25][26] and its mechanical properties, corrosion resistance, and oxidation resistance [27]. Of course, the preparation of the ZrNmodified layer by nitriding on the surface of the zirconium alloy has also been studied, including high-energy nitrogen ion implantation [25,[28][29][30][31] and plasma nitriding [32][33][34]. Nimu Chand Reger et al [32] used thermal nitriding of laser-processed Zr to improve its wear and corrosion properties.…”