Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

Singh, M. Muralidhar; Vijaya, G.; Krupashankara, M.S.; Sridhara, B.K.; Shridhar, T N

doi:10.1016/j.matpr.2018.01.050

Cited by 20 publications

(7 citation statements)

References 8 publications

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“…Aluminium thin films are widely used in microelectronic devices as interconnects for semiconductor chips because of their low resistivity (Quintana et al, 1999). Because of their high optical reflectance, aluminium thin films have also been used in solar applications such as in solar cookers (Lugolole & Obwoya, 2015) and solar concentrators (Muralidhar Singh et al, 2018). The high optical reflectance also makes them be used as coatings in space and aspheric mirrors (Barron, 2005).…”

Section: Introductionmentioning

confidence: 99%

Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates

et al. 2020

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Aluminium (Al) thin films (thickness ranging between 500 and 600 nm) were deposited on stainless-steel substrates at varying radio-frequency (RF) power by magnetron sputtering at a constant substrate temperature of 90°C. Characterisations were undertaken by field emission scanning electron microscopy (FESEM), optical surface profilometry (OSP), atomic force microscopy (AFM), X-ray diffraction (XRD), selected Fourier-transform infrared spectroscopy (FTIR), nanoindentation, and micro-scratch tests. At high RF powers (300-350 W), there was the formation of less porous, dense, and continuous Al thin films with better resistance to scratch failure. The high roughness on films deposited at 200 and 250 W was due to high porosity and oxides observed on the FESEM micrographs.

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Section: Introductionmentioning

confidence: 99%

Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates

et al. 2020

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“…Pulsed DC and Radio frequency magnetron sputtering is most widely used method for oxide or ceramic thin film depositions [2][3][4][5][6][7][8][9][10][11][12][13][14][15]. For pure materials direct current magnetron sputtering is still the best choice [5,[16][17][18][19][20]. Magnetron sputtered thin films are found out to be most clean films as sputtering chambers reaches to ultra-high vacuum levels and stays there continuously without any trouble, that helps to clean chambers from any foreign particles before depositions.…”

Section: Introductionmentioning

confidence: 99%

“…Among these methods, the magnetron sputtering process is advantageous for its large-area deposition ability of thin films with a relatively high deposition rate. For deposition of pure metals magnetron sputtering is more suitable than electrochemical process as it offers less environmental pollution [16].Alumina is always been first choice of researchers for biodegradable implant, semiconductor devices, optics, sensors as a protective coating because of its unique properties [21][22][23][24][25][26][27][28][29]similarly magnesium oxide finds its applications in variety of areas [28,30,31].Characterization of metals and metal oxides is always been area of interest for scientist as its reveals the structure, surface morphology of thin films. In this study Scanning electron microscopy (SEM) [32,33]is used to understand the changes in surface structure after alerting the oxygen contents and pressures, to understand the change in surface roughness of nanolaminates atomic force microscopy is used [34,35].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films

Deshmukh¹,

Shendokar²,

Sankar³

2023

Global J. Eng. Technol. Adv.

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Thin films have always shown high sensitivity to its deposition parameters and surface morphology. Magnetron sputtering is known for its high level of consistency in deposition and repeatability. In this study Mg/Al2O3 nanolaminates in a range of 10 to 40 nm were synthesized using Direct current and Pulsed DC sputtering techniques at room temperature on glass substrates and silicon substrate using different oxygen flow rates and varying total pressure conditions to understand its effect on deposition rates and roughness of thin films. It is observed that more power and resources consumed for higher deposition time. Roughness of the film is very sensitive for certain applications like corrosion, Lenses, Implants. Scanning electron microscopy (SEM), Atomic force microscopy (AFM) were used to characterize the morphology, structure of the thin films. Optical microscopy and X-ray reflectometry (XRD-XRR) techniques confirmed the optical density and thickness of the nanolaminates respectively. It is confirmed that as total pressure and oxygen flow rate rises deposition rate significantly goes down, that impacts deposition time and roughness of thin films.

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“…Free electrons in the metal/ITO materials accelerate the separation of charge carriers and hence improve the transport from the lower to the upper part of the device [9]. The good adhesion, low resistivity, and the stability against oxidation and corrosion of Al films make them suitable for application in optical and electronic devices [18][19][20]. The low resistivity and relatively high transmittance (compared to other metals) in the visible region of Ag thin films at room temperature led to the wide use of Ag layers in ITO multilayer contacts [21][22][23][24].…”

Section: Introductionmentioning

confidence: 99%

Structural optical and electrical properties of a transparent conductive ITO/Al–Ag/ITO multilayer contact

Isiyaku¹,

Ali²,

Nayan³

2020

Beilstein J. Nanotechnol.

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Indium tin oxide (ITO) is a widely used material for transparent conductive oxide (TCO) films due to its good optical and electrical properties. Improving the optoelectronic properties of ITO films with reduced thickness is crucial and quite challenging. ITO-based multilayer films with an aluminium–silver (Al–Ag) interlayer (ITO/Al–Ag/ITO) and a pure ITO layer (as reference) were prepared by RF and DC sputtering. The microstructural, optical and electrical properties of the ITO/Al–Ag/ITO (IAAI) films were investigated before and after annealing at 400 °C. X-ray diffraction measurements show that the insertion of the Al–Ag intermediate bilayer led to the crystallization of an Ag interlayer even at the as-deposited stage. Peaks attributed to ITO(222), Ag(111) and Al(200) were observed after annealing, indicating an enhancement in crystallinity of the multilayer films. The annealed IAAI film exhibited a remarkable improvement in optical transmittance (86.1%) with a very low sheet resistance of 2.93 Ω/sq. The carrier concentration increased more than twice when the Al–Ag layer was inserted between the ITO layers. The figure of merit of the IAAI multilayer contact has been found to be high at 76.4 × 10−3 Ω−1 compared to a pure ITO contact (69.4 × 10−3 Ω−1). These highly conductive and transparent ITO films with Al–Ag interlayer can be a promising contact for low-resistance optoelectronics devices.

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Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

Cited by 20 publications

References 8 publications

Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates

Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates

Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films

Structural optical and electrical properties of a transparent conductive ITO/Al–Ag/ITO multilayer contact

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