2021
DOI: 10.1016/j.apsusc.2021.150285
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Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere

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Cited by 19 publications
(9 citation statements)
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“…In pristine MoSe 2 , Mo 3d deconvoluted spectrum has peaks at 229, 232, and 232.5 eV due to the presence of Mo─Se, Mo 3+ and Mo 6+ , respectively. [51][52][53] In MoSe 2 /rGO heterostructure, Mo 3d deconvoluted spectrum has peaks at 228.5 and 231.5, and 232.5 eV due to the presence of Mo─Se, Mo 3+ , and Mo 6+ , respectively. [51,52] The negative shift was observed in the peaks of the MoSe 2 /rGO heterostructure due to the formation of the heterostructure, demonstrating the formation of interfacial Mo─Se bond between MoSe 2 and rGO.…”
Section: Resultsmentioning
confidence: 99%
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“…In pristine MoSe 2 , Mo 3d deconvoluted spectrum has peaks at 229, 232, and 232.5 eV due to the presence of Mo─Se, Mo 3+ and Mo 6+ , respectively. [51][52][53] In MoSe 2 /rGO heterostructure, Mo 3d deconvoluted spectrum has peaks at 228.5 and 231.5, and 232.5 eV due to the presence of Mo─Se, Mo 3+ , and Mo 6+ , respectively. [51,52] The negative shift was observed in the peaks of the MoSe 2 /rGO heterostructure due to the formation of the heterostructure, demonstrating the formation of interfacial Mo─Se bond between MoSe 2 and rGO.…”
Section: Resultsmentioning
confidence: 99%
“…[51][52][53] In MoSe 2 /rGO heterostructure, Mo 3d deconvoluted spectrum has peaks at 228.5 and 231.5, and 232.5 eV due to the presence of Mo─Se, Mo 3+ , and Mo 6+ , respectively. [51,52] The negative shift was observed in the peaks of the MoSe 2 /rGO heterostructure due to the formation of the heterostructure, demonstrating the formation of interfacial Mo─Se bond between MoSe 2 and rGO. This negative shift is attributed to the strong electronic interactions between MoSe 2 and rGO.…”
Section: Resultsmentioning
confidence: 99%
“…The chamber pressure was maintained at 10 –9 mbar. Additionally, the fitting of XPS spectra was performed using the Shirley background subtraction method …”
Section: Methodsmentioning
confidence: 99%
“…This advantage could be also used in other type of devices that could take advantage of such physicochemical surface properties. Moreover, most of these contacts can be deposited using simple techniques such as thermal evaporation, sputtering, atomic layer deposition (ALD) or spin coating [15][16] [17] . Hence, flammable and toxic boron/phosphorous gas precursors used for doping in techniques such as Thermal Diffusion or Plasma-Enhanced Chemical Vapour Deposition (PECVD) can be avoided [18][19] .…”
Section: Introductionmentioning
confidence: 99%