2019
DOI: 10.1039/c8ta12089g
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Deposition and application of a Mo–N back contact diffusion barrier yielding a 12.0% efficiency solution-processed CIGS solar cell using an amine–thiol solvent system

Abstract: The use of a Mo–N barrier for solution-processed CIGS results in reduced MoSe2 formation. This enabled longer selenization time, enhanced grain growth and performance.

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Cited by 25 publications
(18 citation statements)
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References 38 publications
(52 reference statements)
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“…(Bower's group at Lboro) studied the effects of absorber film delamination and high device series resistances due to thick MoSe 2 layers for en/EDT‐based CIGSe devices. [ 157 ] By implementing a Mo/Mo–N/Mo multilayer back contact, the authors were able to control and reduce the MoSe 2 layer thickness, achieving device PCEs of 12.1% (no ARC, total area) from molecular inks of Cu 2 S, In 2 S 3, and Ga+Se in en/EDT. Agrawal's group reported Cu, In, and Se complexes by individually dissolving elemental Cu, In, and Se in HA/EDT solutions and evaporating off the solvent solution at room temperature in a glove box.…”
Section: Protic Solvents With Shmentioning
confidence: 99%
“…(Bower's group at Lboro) studied the effects of absorber film delamination and high device series resistances due to thick MoSe 2 layers for en/EDT‐based CIGSe devices. [ 157 ] By implementing a Mo/Mo–N/Mo multilayer back contact, the authors were able to control and reduce the MoSe 2 layer thickness, achieving device PCEs of 12.1% (no ARC, total area) from molecular inks of Cu 2 S, In 2 S 3, and Ga+Se in en/EDT. Agrawal's group reported Cu, In, and Se complexes by individually dissolving elemental Cu, In, and Se in HA/EDT solutions and evaporating off the solvent solution at room temperature in a glove box.…”
Section: Protic Solvents With Shmentioning
confidence: 99%
“…The MoN x layer acts as a barrier layer to prevent excess MoSe 2 formation during selenization. 40 Finally a very thin layer of molybdenum (B50 nm) was deposited to act as a sacrificial layer to form the small amount of MoSe 2 that is beneficial to cell performance. The total Mo/MoN x /Mo stack was approximately 1 mm thick.…”
Section: Deposition Of Molybdenum Back Contact and Monmentioning
confidence: 99%
“…The solution‐processing method presented in our as well as other groups' previous work is a very promising approach which takes the benefits of the hydrazine method but using a safer and more environmentally friendly solvent system 10–13 . This approach consists of dissolving metal chalcogenides in 1,2‐ethylenediamine/1,2‐ethanedithiol (EDA/EDT) and was shown to result in devices with 12.05% power conversion efficiency ( PCE ) prepared by a scalable spray‐coating technique in ambient conditions 14 . This binary amine‐thiol solvent mixture discovered in 2013 by Brutchey and Webber was found to have the ability to dissolve over 65 bulk inorganic materials.…”
Section: Introductionmentioning
confidence: 99%