2013
DOI: 10.1002/cvde.201207014
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Dependence of Si/SnO2 Heterojunction Properties on Growth Temperature and Type of Silicon**

Abstract: Polycrystalline pure tin oxide thin films of tetragonal rutile structures are deposited on two kinds of single-crystal and polycrystalline p-type Si at three substrate temperatures of 300, 400, and 500°C. Structural, electrical, and optical properties of these thin films are characterized by X-ray diffraction (XRD), two-point probe method, and UV-vis spectrophotometry, respectively. I-V measurements of these heterojunctions show that the barrier height and series resistance will increase with increasing substr… Show more

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Cited by 3 publications
(4 citation statements)
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“…As in our previous studies about the effect of oxygen flow rate and substrate temperature, all polycrystalline films show peaks related to (110), (101), (211), (200), (220), (301), and (310) planes . The intensities of (110), (200), and (211) peaks are stronger than the others.…”
Section: Resultssupporting
confidence: 77%
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“…As in our previous studies about the effect of oxygen flow rate and substrate temperature, all polycrystalline films show peaks related to (110), (101), (211), (200), (220), (301), and (310) planes . The intensities of (110), (200), and (211) peaks are stronger than the others.…”
Section: Resultssupporting
confidence: 77%
“…Unlike our previous studies in which (211) was the preferred orientation, in this paper (110) is the preferred orientation in all cases . This may have occurred for two reasons.…”
Section: Resultscontrasting
confidence: 66%
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“…Adding rare earth oxide in coating is the same as introducing the impurities [25,26] such as Si, P in the SnO 2 semiconductor materials, the introduction of donor or acceptor level can reduce the band gap, so as to improve the conductivity of electrode materials.…”
Section: Xrdmentioning
confidence: 99%