Abstract:We have studied how orientation of planar magnetron sputtered ZnO varies as a function of radius from the center of the sputter target. We show that orientation deviates from normal with increasing radius from center, even on substrates parallel to the sputter cathode. The ZnO was deposited upon C-axis normal sapphire (A1203), fused quartz, and 11 1-Si under varied conditions. Deposition conditions that were varied include temperature, gas flow rate, sputter power, radial position relative to target center, an… Show more
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