Abstract:The effect of Ni to Si ratio on effective work function (È eff ) modulation with phosphorus (P) segregation at the Ni silicide/ SiO 2 interface was systematically investigated. To discriminate the P segregation effect from other parasitic possibilities of È eff modulation, which are changes in Ni-Si ratio and crystallinity including crystal grain orientation near the interface, we applied a P post-doping process for Ni 2 Si (Ni 3 Si 2 )/SiO 2 , NiSi/SiO 2 , and NiSi 2 /SiO 2 systems. In the post-doping process… Show more
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