2016
DOI: 10.1166/jnn.2016.12523
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Dependence of Bias Stress on Hydrophobicity of Gate Insulator in Solution-Processed Organic Thin-Film Transistors

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Cited by 3 publications
(2 citation statements)
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“…Previous studies have shown that the charge trapping–induced bias stress instability of OFETs is closely related to the surface properties of gate dielectrics such as their surface roughness and hydrophobicity . Thus, effective modifications of gate dielectric surfaces are required that improve device bias stress stability without significantly degrading the desired properties of the OSC layers.…”
Section: Recent Progress In Improving the Bias Stress Stability Of Ormentioning
confidence: 99%
“…Previous studies have shown that the charge trapping–induced bias stress instability of OFETs is closely related to the surface properties of gate dielectrics such as their surface roughness and hydrophobicity . Thus, effective modifications of gate dielectric surfaces are required that improve device bias stress stability without significantly degrading the desired properties of the OSC layers.…”
Section: Recent Progress In Improving the Bias Stress Stability Of Ormentioning
confidence: 99%
“…Solution-processed organic thin-film transistors (S-OTFTs) have attracted much attention for realizing flexible or plastic electronics due to their mechanical flexibility, high scalability and low-cost manufacturing [1][2][3]. In addition, the values of the mobility of organic semiconductors (OSCs) reach as high as the mobility of typical amorphous silicon through several methods of reducing the trap densities of the organic films [3][4][5][6][7]. Generally, for the fabrication of the S-OTFTs, the orthogonal characteristics of solvents play critical roles on the preparation of the OSC layer onto the underlying polymer insulator in sequence [8,9].…”
Section: Introductionmentioning
confidence: 99%