Abstract:Abstract. Porous silicon (PS) layers were formed by anodization on polished substrates of (1 0 0) Si at different current densities for a fixed anodization time of 30 mins. using different screenprinted/evaporated back contacts (Ag, Al) respectively. The PS films has been characterized by high resolution X-ray diffraction (HRXRD), photoluminescence (PL), Scanning Electron Microscopy (SEM) and Fourier Transform Infrared (FTIR) techniques respectively. Porosity and thickness of PS layers were estimated by gravim… Show more
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