Abstract:The throughput has long been and still is a major issue in electron-beam systems such as those used for lithography and inspection. We have previously described a method which generates multiple primary beamlets and focuses them simultaneously by applying a uniform axial magnetic field. This method allows a significant increase in total current without the growth of Coulomb blurring, by virtue of the absence of a crossover [1,2].As with other multiple electron beam systems, secondary electron detection is one … Show more
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