Demonstration of enhanced absorption in thin film Si solar cells with periodic microhemisphere hole arrays

Broadband anti-reflection coating using dielectric Si3N4 nanostructures. Application to amorphous-Si-H solar cells

“…Even moderate improvements of this parameter are of great interest because they may save materials and space in solar power stations relying on this technology. Actually, relative increases in the order of 8-12% have been considered as promising when applied to different types of solar cells incorporating nanostructures and light trapping schemes [5][6][7]. Large increases in efficiency and J sc are reserved for innovative materials and disruptive technologies.…”

Light trapping characteristics of glass substrate with hemisphere pit arrays in thin film Si solar cells

“…Our test results showed that the short circuit current density and total PCE can each be increased about 8% and 5% by covering the HP glass on the surface of thin Si film solar cells. [21] These experiment results have demonstrated that the HP glass substrate can effectively enhance the light absorption, but the mechanism research of light absorption increase on this HP glass, especially the light trapping characteristics in thin film Si solar cells, is lacking. Moreover, little theoretical research on the light trapping glass substrate for photovoltaic devices was reported.…”

“…It is a periodic microhemispherical pit (HP) arrays, the periodic and the diameter of the pit are about 10 µm and 4 µm-5 µm, respectively. [21,22] Compared with conventional nanoscale light trapping structures, this glass with micro-HP arrays (HP glass for short) is not only cheap and easy to fabricate, but also very sensitive to the long-wave band. The fabrication of the HP glass consists mainly of only three processes: (i) sputtering, (ii) ultraviolet (UV) lithographing, and (iii) wet etching.…”