Carrier dynamics in GaN and InGaN/GaN SQW structures were observed by using the transient grating (TG) method with sub-picosecond pulsed laser at room temperature. The diffusion coefficients (D) of photo-created carriers were estimated by the decay rate time of TG signals and the photoluminescence (PL) lifetime. It was found that D depends on the emission wavelength (In composition). The relationship between the emission efficiencies and carrier diffusion was considered in terms of the spatial inhomogeneity of In composition.Recently, InGaN/GaN-based light emitting diodes (LEDs) have been commercialized in ultraviolet (UV), blue, green, and amber spectral region [1,2]. In particular, the external quantum efficiency (h ext ) of about 20% is now achieved in blue (450 nm) LEDs. However, h ext values are still lower for LEDs out of this blue spectral range, but detailed reasons for the reduction of h ext have so far not been elucidated. In this study, we try to elucidate this reason by the viewpoint of carrier dynamics. The transient grating (TG) method which is one of third-order nonlinear spectroscopy, has been used for GaN to detect the nonlinear susceptibility [3], exciton dephasing time [4], time response of scattering [5], or quantum beat [6], etc. It is also a powerful tool to directly detect diffusion processes. By using this method, Haag et al. [7] have measured and reported the carrier diffusion in GaN. We observed the diffusion of heat energy generated by the nonradiative recombination of carriers in GaN and ZnSe by the TG method with nano-second pulsed laser [8,9]. In this work, we observed carrier diffusion in InGaN/GaN-based SQW structures in UV, blue, green, and amber spectral region by using the TG method with sub-picosecond pulsed laser.The samples used in this study were grown on a (0001) oriented sapphire (Al 2 O 3 ) substrate by a two-flow metalorganic chemical vapor deposition (MOCVD) technique [10]. The thickness of GaN bulk layer is 4 mm. GaN/InGaN SQW structure is composed of a GaN (1.5 mm), an n-GaN:Si (2.3 mm), an InGaN SQW (3 nm) and a GaN cap (5 nm) layer. LED structure of GaN/InGaN SQW is composed of GaN (30 nm), n-type 1 GaN : Si (5 mm), InGaN SQW (3 nm), p-type AlGaN : Mg (60 nm) and p-type GaN : Mg (150 nm).For the TG measurement, a mode-locked fiber laser and regenerative amplifier system (Clark) was used. The frequency doubled beam (388 nm) was used as pump beam. Pulse width, power, and repetition rate were 500 fs, 1 mW and 1 Hz, respectively. The pump beam was split into two coherence beams and crossed again in the sample with q = 30 and 120 . The modulation of carrier density (grating) is created in the sample by the interference pattern. The fundamental beam (775 nm) was used as a probe beam with the optical delay unit. The probe beam was partly diffracted, which was detected by a photomultiplier tube (Hamamatsu) and averaged with a boxcar integrator. For the time-resolved photoluminescence (TRPL) measurements, the frequency doubled beam of a mode-locked Ti : sapphire laser (Spec...