Deformation analysis of the surface micromachined MEMS structures due to the plasma ashing process

Kim, Jong-Hun; Hwang, Geun-Cheol; Lee, Baek-U; Kim, Jeong-Gil; Kim, Gwang-Seok; Baek, Chang-Uk; Kim, Yong-Gwon; Gwon, Dong-Il; Kim, Yong-Hyeop

doi:10.5139/jksas.2003.31.7.053

Cited by 2 publications

(2 citation statements)

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“…If the temperature difference between the top and the bottom surfaces is large enough to generate thermal stress over the material yield stress, it will contribute to the total deflection of the cantilever when the releasing process is completed and the temperature difference disappears. It is reported that the temperature difference between the top and the bottom surfaces is about 140 • C during the releasing process [19]. The three-dimensional FEA yields the maximum stress of 340 MPa near the anchor for the temperature difference of 140 • C. Figure 8 shows the results of the threedimensional FEA for the cantilever of length 100 µm.…”

Section: Thermal Stress Generated By the Plasma Ashing Processmentioning

confidence: 99%

“…When the sacrificial layer is removed, a temperature gradient may be formed between the top and the bottom surfaces of the structure because the burning temperature of PR is much higher than the ambient temperature of the chamber [19]. It may generate the thermal stress gradient in the cantilever beam.…”

Section: Thermal Stress Generated By the Plasma Ashing Processmentioning

confidence: 99%

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Low-thermal-budget and selective relaxation of stress gradients in gold micro-cantilever beams using ion implantation

Kang¹,

Kim²,

Lee³

et al. 2005

J. Micromech. Microeng.

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The stress gradient of gold micro-cantilever beams induced during dry-release in oxygen plasma is quantitatively studied, and the relaxation of the stress gradient by He and N2 ion implantation is investigated. An analytic model considering the finite anchor stiffness of a step-up anchor and the geometry of the beam cross-section is constructed to evaluate the induced stress gradient. Various measurements are carried out to verify the effectiveness of ion implantation in relaxing the stress gradient.

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Section: Thermal Stress Generated By the Plasma Ashing Processmentioning

confidence: 99%

Section: Thermal Stress Generated By the Plasma Ashing Processmentioning

confidence: 99%