Deformable grating optical modulator

Solgaard, Olav; Sandejas, F. S. A.; Bloom, D. M.

doi:10.1364/ol.17.000688

Cited by 251 publications

(103 citation statements)

References 4 publications

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“…Over these years, many MEMS VOA designs have emerged based on the mechanisms of partially blocking the light using a shutter [4]- [10] (i.e., shutter-type VOAs) and steering away the light beam using a mirror [11]- [19] (i.e., mirror-type VOAs). Although other physical mechanisms have also been presented such as laser interference [20], [21], evanescent field coupling [22] and photoacoustic interaction [23], the shutter-type and mirror-type VOAs have received most interest of research and commercialization due to easy implementation/integration and superior optical performance [24]. Among many specifications of the VOA, nearly all applications require low insertion loss , large attenuation range or even ), fast response speed , low wavelength dependent loss (WDL) and low polarization dependent loss (PDL).…”

Section: Introductionmentioning

confidence: 99%

Asymmetric Tuning Schemes of MEMS Dual-Shutter VOA

Zhang

Zhao

Liu

et al. 2008

J. Lightwave Technol.

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Abstract-A dual-shutter MEMS variable optical attenuator (VOA) is designed for advanced tuning functions such as linear attenuation relationship and simultaneous coarse and fine tunings. The mechanism behind is to take advantage of the additional shutter to render one more degree of freedom for attenuation adjustment. Although dual-shutter VOAs with asymmetric functionalities have been reported before, these intrinsic capabilities owing to asymmetry have not been extensively investigated. In experiment, the fabricated VOA device has demonstrated a linear tuning over a 20-dB range with respect to the driving voltage of one shutter, and it has also realized simultaneously coarse tuning (2.5 dB/V) and fine tuning (0.1 dB/V) by the two shutters. Ideally, the tuning can start from any available working point, linear to any controlling parameter, at any slope of linearity, and with any tuning resolution. Theoretical attenuation model has also been developed to provide a roadmap for the VOA design and choice of working point. An interesting finding is that over a certain range the linear attenuation can be obtained by moving a fixed aperture rather than by reducing the aperture size, which greatly relaxes the difficulty of shutter position control. The measured results match well with the theoretical data, implying the possibility of developing a look-up table to locate the shutter positions quickly. The dual-shutter VOA accomplishes these features without the need of high-precision control systems and therefore gives a structure-based rather than a control-system-based solution, clearly advantageous over the previously developed VOAs.

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Section: Introductionmentioning

confidence: 99%

Asymmetric Tuning Schemes of MEMS Dual-Shutter VOA

Zhang

Zhao

Liu

et al. 2008

J. Lightwave Technol.

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“…Next, the whole panel is exposed by ultraviolet (UV) light (2), in order to enable patterning of the DFR (3). The spaces in the patterned DFR act as template for the deposition of copper by electroplating (4). The removal of DFR (5) is followed by a flash etch to remove the Cu seed layer (6).…”

Section: Laser Direct Imaging For Advanced Substrates In Semiconductomentioning

confidence: 99%

High-speed one-dimensional spatial light modulator for Laser Direct Imaging and other patterning applications

et al. 2014

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Fraunhofer IPMS has developed a one-dimensional high-speed spatial light modulator in cooperation with Micronic Mydata AB. This SLM is the core element of the Swedish company's new LDI 5sp series of Laser-Direct-Imaging systems optimized for processing of advanced substrates for semiconductor packaging. This paper reports on design, technology, characterization and application results of the new SLM. With a resolution of 8192 pixels that can be modulated in the MHz range and the capability to generate intensity gray-levels instantly without time multiplexing, the SLM is applicable also in many other fields, wherever modulation of ultraviolet light needs to be combined with high throughput and high precision.

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“…NIR (near infrared) micro-spectrometer has been investigated extensively [1][2][3][4] and attracted considerable attention due to its broad applications in monitoring field. [5][6][7][8][9] Traditional NIR microspectrometer works with fixed diffraction grating and thus needs detector arrays for collecting NIR spectrum.…”

Section: Introductionmentioning

confidence: 99%

Modeling of MOEMS electromagnetic scanning grating mirror for NIR micro-spectrometer

et al. 2016

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In this paper, the mathematical model is developed for researching the detailed electromagnetic mechanism of MOEMS scanning mirror. We present the relationship between spectral range and optical scanning angle. Furthermore, the variation tendencies of resonant frequency and maximal torsional angle are studied in detail under different aspect ratios of MOEMS scanning mirror and varied dimensions of torsional bar. The numerical results and Finite Element Analysis simulations both indicate that the thickness of torsional bar is the most important factor. The maximal torsional angle appears when the aspect ratio equals to 1. This mathematical model is an effective way for designing the MOEMS electromagnetic scanning grating mirror in actual fabrication

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Deformable grating optical modulator

Cited by 251 publications

References 4 publications

Asymmetric Tuning Schemes of MEMS Dual-Shutter VOA

Asymmetric Tuning Schemes of MEMS Dual-Shutter VOA

High-speed one-dimensional spatial light modulator for Laser Direct Imaging and other patterning applications

Modeling of MOEMS electromagnetic scanning grating mirror for NIR micro-spectrometer

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