Abstract:One of the concerned phenomena that influencing to the performance of electron beam mask writer is contamination of deflector. Previous studies show that the relation between the deflector contamination and pattern placement error. In fact, the source of the contamination of deflector was not defined clearly yet. However, the fact that of deflector contamination clearly influences the pattern placement error on mask fabrication. We think that there is no detailed investigation about the effect of deflector con… Show more
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.