Ion Beam Modification of Materials 1996
DOI: 10.1016/b978-0-444-82334-2.50012-5
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Defect production by MeV cluster impacts

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Cited by 2 publications
(5 citation statements)
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“…Compared to [66,67] our initial energy distribution differs by less than 10% for an Al beam in silicon with energies ranging between 0.37 and 370 MeV/u. The nuclear stopping power was neglected on the basis of the experimental results given by Döbeli et al [32]. Below the threshold of electronic damage creation by C n cluster in Si, the damage induced by nuclear collisions decreases when increasing the electronic energy loss.…”
Section: Discussionmentioning
confidence: 99%
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“…Compared to [66,67] our initial energy distribution differs by less than 10% for an Al beam in silicon with energies ranging between 0.37 and 370 MeV/u. The nuclear stopping power was neglected on the basis of the experimental results given by Döbeli et al [32]. Below the threshold of electronic damage creation by C n cluster in Si, the damage induced by nuclear collisions decreases when increasing the electronic energy loss.…”
Section: Discussionmentioning
confidence: 99%
“…Finally, for silicon irradiated at 300 K by C n carbon clusters at constant velocities (0.8 MeV per carbon with n = 1 -8, leading to S e from 1 to 8 keV/nm), damage production at the surface has been observed [32]. The defects appear for S e larger than 5 keV/nm, and their number increases with S e .…”
Section: Damage Creationmentioning
confidence: 95%
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“…In addition, the Φ c value drops down to ≈ 5 × 10 13 at/cm 2 when the irradiation is performed with clusters. Such a nonlinear effect for defect creation in Si has already been pointed out by means of Ge + n (n ≤ 3) irradiations at an energy of 2.8 MeV per atom [14] and by fullerene irradiations at energies up to 530 keV [15]. Interestingly, the ion emission yields of CsI targets [16] and the sputtering yields of gold targets [17] bombarded with gold clusters exhibit also a nonlinear dependence on the cluster size.…”
Section: Cluster Effect On Damage Production In Silicon Crystalmentioning
confidence: 80%