2020
DOI: 10.1038/s41524-020-00378-4
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Defect-mediated Rashba engineering for optimizing electrical transport in thermoelectric BiTeI

Abstract: The Rashba effect plays a vital role in electronic structures and related functional properties. The strength of the Rashba effect can be measured by the Rashba parameter α R ; it is desirable to manipulate α R to control the functional properties. The current work illustrates how α R can be systematically tuned by doping, taking BiTeI as an example. A five-point-spin-texture method is proposed to efficiently screen doped BiTeI systems with the Rashba effect. Our results show that α R in doped BiTeI can be man… Show more

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Cited by 26 publications
(20 citation statements)
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“…The two parabolic branches with opposite spin aligned states occur as a consequence of specific atomic site asymmetries on either side of the Γ point just 0.09 eV above the Fermi level. 18,[38][39][40] We observe its effect on the fourth set of doubly degenerate band (of L CB ) which shows three valleys CV 2 at Γ point 0.02 eV above the Fermi level, CV 3 at Γ+δ′ in Γ→Z direction 0.04 eV above the Fermi level and CV 4 at Γ-δ′′ in Γ→M direction 0.06 eV above the Fermi level. Thus, Mo doping in SnTe provides a new approach for the generation of multiple bands for transport which lie in close vicinity of the Fermi level resulting in the increased 'S' values.…”
Section: Resultsmentioning
confidence: 80%
“…The two parabolic branches with opposite spin aligned states occur as a consequence of specific atomic site asymmetries on either side of the Γ point just 0.09 eV above the Fermi level. 18,[38][39][40] We observe its effect on the fourth set of doubly degenerate band (of L CB ) which shows three valleys CV 2 at Γ point 0.02 eV above the Fermi level, CV 3 at Γ+δ′ in Γ→Z direction 0.04 eV above the Fermi level and CV 4 at Γ-δ′′ in Γ→M direction 0.06 eV above the Fermi level. Thus, Mo doping in SnTe provides a new approach for the generation of multiple bands for transport which lie in close vicinity of the Fermi level resulting in the increased 'S' values.…”
Section: Resultsmentioning
confidence: 80%
“…41 The decrease in the carrier mobility caused by the increase in band effective mass due to the resonant states is compensated by the increased number of valleys involved in the transport. 6,43 Such Rashba splitting is not previously observed in n-type resonant dopants like Bi or even in p-type dopants like In and Zn in SnTe, which shows a single maximum in the spin degenerate parabolic band in conduction and valence bands in n and p-type materials, respectively. 16,18,29,41 This feature is very unique to V-doped SnTe, which promotes more band edges to participate in the transport.…”
Section: ■ Computational Detailsmentioning
confidence: 84%
“…Such a defectmediated Rashba engineering is a consequence of a low-atomicmass V dopant, which induces local strain. 43 Although generation of multiple electronic valleys by band inversion was previously reported in Zn-doped Pb 0.6 Sn 0.4 Te, it was a p-type material with involvement of toxic lead as the major component. 44 The added advantage in the n-type Sn 15 VTe 16 is the proximity of these conduction band valleys and the resonance states to the Fermi level, which eliminates the requirement of an additional dopant to tune the Fermi level.…”
Section: ■ Computational Detailsmentioning
confidence: 97%
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“…Recently, ternary BiTeI has been reported as a promising TE material, [31–35] which possesses the Rashba‐type spin splitting band structures and strong internal electric fields that contribute to higher Seebeck coefficient and intrinsic low lattice thermal conductivity [34] . However, due to the similar atomic radius of Te 2− and I − (2.07 Å vs. 2.06 Å), [36] high concentration of antisite defects ITe and TeI' exist in BiTeI, [37] just like in the case of Bi 2 Te 3 system, where high concentration of BiTe' and TeBi antisite defects exist [38] .…”
Section: Introductionmentioning
confidence: 99%