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2021
DOI: 10.1088/1361-6501/abf730
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Defect localization in high-power vertical cavity surface emitting laser arrays by means of reverse biased emission microscopy

Abstract: Applying a reverse bias near the breakdown voltage results in photon emission at the pn-junction in vertical cavity surface emitting lasers (VCSELs). This radiation can be collected with an emission microscope. Here, this technique is employed to investigate a high-power two dimensional (2D) VCSEL array with a large number of emitters at a non-degraded state and after high electrical stress. It has been found that non-degraded arrays show varying photon intensities across all emitters at breakdown condition wh… Show more

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Cited by 9 publications
(1 citation statement)
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“…A widely used method for device characterization is the measurement of IV characteristics under reverse bias without illuminating the device with light. In particular this method was recently utilized in a number of VCSEL reliability studies [18][19][20][21] due to its sensitivity to defective states creation in or near the pn junction. This manifests itself by an increase of leakage current at fixed reverse bias after high current operation or electrostatic discharge testing.…”
Section: Analysis Of the Cavity Region With IV Characteristics Under ...mentioning
confidence: 99%
“…A widely used method for device characterization is the measurement of IV characteristics under reverse bias without illuminating the device with light. In particular this method was recently utilized in a number of VCSEL reliability studies [18][19][20][21] due to its sensitivity to defective states creation in or near the pn junction. This manifests itself by an increase of leakage current at fixed reverse bias after high current operation or electrostatic discharge testing.…”
Section: Analysis Of the Cavity Region With IV Characteristics Under ...mentioning
confidence: 99%