2019
DOI: 10.1016/j.memsci.2019.05.047
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Defect-free high-silica CHA zeolite membranes with high selectivity for light gas separation

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Cited by 50 publications
(13 citation statements)
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“…SSZ-13 membranes have attracted many interests of researchers , ,, for gas separations due to their high separation performance and good resistance to water vapor. All of the SSZ-13 membranes were prepared by conventional hydrothermal synthesis where the substrates were fully immersed in a large volume of the gel/solution.…”
Section: Results and Discussionmentioning
confidence: 99%
“…SSZ-13 membranes have attracted many interests of researchers , ,, for gas separations due to their high separation performance and good resistance to water vapor. All of the SSZ-13 membranes were prepared by conventional hydrothermal synthesis where the substrates were fully immersed in a large volume of the gel/solution.…”
Section: Results and Discussionmentioning
confidence: 99%
“…The traditional way to remove TMAdaOH from the membrane was calcination at 550 °C in air for about 10 h, ,, which resulted in defects for mismatch of the thermal expansion coefficient between the membrane and the support. An improved way to reduce defects was calcination in oxygen , or pretreatment with ozonication, , but it needed more investment in equipment. Rapid thermal processing has been reported recently to avoid the formation of defects .…”
Section: Introductionmentioning
confidence: 99%
“…CHA-type zeolite framework is a 3-dimensional interconnected microporous system with an accessible 3.8 × 3.8 Å window of small eight-membered rings and large ellipsoidal 6.7 × 10 Å cavities [ 11 ]. Pure-silica (Si-CHA) [ 12 ], aluminosilicate (chabazite [ 13 ] and SSZ-13 [ 14 ]) and silicoaluminophosphate (SAPO-34) [ 15 ] belong to the CHA-type zeolite. The chabazite zeolite with a Si/Al molar ratio of 2 to 5 shows a higher acid-resistance in solvent dehydration compared to the commercially available NaA zeolite membrane with a Si/Al molar ratio of 1 [ 16 , 17 , 18 , 19 ].…”
Section: Introductionmentioning
confidence: 99%