Defect and transport properties of nonstoichiometric cobaltous sulfide

Danielewski, Marek; Mrowec, S.; Wójtowicz, Anna K.

doi:10.1007/bf00738287

Cited by 7 publications

(2 citation statements)

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“…On a separate note, it has been known that the ion diffusivity in metal sulfides could be enhanced by the vacancies in the film, and the density of vacancies could be modulated by the H 2 S gas . Given that H 2 S has been widely used as the sulfur source in metal sulfide ALD, , the effect of H 2 S on the above diffusion process could be very important for the relevant film growth.…”

Section: Resultsmentioning

confidence: 99%

Metal Exchange and Diffusion during Atomic Layer Deposition of Cobalt and Nickel Sulfides

et al. 2021

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Atomic layer deposition (ALD) has become an essential tool to fabricate high-quality thin-film materials with atomic-level control. Early ALD studies mostly focused on binary metal oxides, but recently, ALD of multielement compounds (e.g., ternary metal sulfides) has triggered significant interest for numerous emerging applications. However, controllable ALD synthesis of multielement compounds is comparatively much more complicated and challenging, and particularly, the involved mechanisms can be complex and sometimes difficult to interpret. In this work, we show that, as a representative attempt to synthesize ternary cobalt nickel sulfides (Co x Ni y S) by ALD, directly depositing nickel sulfide (NiS x ) on cobalt sulfide (Co 9 S 8 ) can be significantly affected by the gas−solid metal exchange reaction on the surface and the metal-ion diffusion inside the film. A series of detailed mechanistic investigation is carried out, with the employment of in situ X-ray photoelectron spectroscopy (XPS) technique and numerical simulation, to understand the crucial role and interplay of the metal exchange and diffusion in the process. The understanding of the mechanisms can provide insights into achieving a high level of controllability in multielement ALD.

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Section: Resultsmentioning

confidence: 99%

Metal Exchange and Diffusion during Atomic Layer Deposition of Cobalt and Nickel Sulfides

et al. 2021

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“…Thus, sulfidation of bulk cobalt has been studied in some depth, with a particularly impressive set of experiments by Mrowec and colleagues. 62,[64][65][66][67] It was demonstrated convincingly that growth of µm or mm-scale sulfide films on bulk cobalt proceed almost completely by outward transport of Co cations from the buried Co to the sulfidevapor interface. Thus, it is reasonable to postulate that hollow particles are formed due to 22 The sample for this experiment was a block of brass coated with a pure copper layer.…”

Section: Mechanism: Kirkendall-type Effectmentioning

confidence: 99%