1991
DOI: 10.1126/science.2020853
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Deep UV Photochemistry of Chemisorbed Monolayers: Patterned Coplanar Molecular Assemblies

Abstract: Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template fo… Show more

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Cited by 485 publications
(366 citation statements)
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“…Understanding the photoreactivity of SAMs is important for optimizing photoresist patterning processes involving SAMs. [7][8][9][10][11] As the feature sizes in lithography continue to scale down, there is an increasing demand on the resist films in terms of thickness and structural uniformity. [12][13][14][15] SAMs are an attractive candidate for nanoscale resists due to their molecular thickness and well-defined structure on nanometer length scales, which in principle should enable nanometer resolution in pattern transfer.…”
Section: Introductionmentioning
confidence: 99%
“…Understanding the photoreactivity of SAMs is important for optimizing photoresist patterning processes involving SAMs. [7][8][9][10][11] As the feature sizes in lithography continue to scale down, there is an increasing demand on the resist films in terms of thickness and structural uniformity. [12][13][14][15] SAMs are an attractive candidate for nanoscale resists due to their molecular thickness and well-defined structure on nanometer length scales, which in principle should enable nanometer resolution in pattern transfer.…”
Section: Introductionmentioning
confidence: 99%
“…photochemical modification of uniform, thin organic films [7][8][9]; 2. spatially-controlled radio frequency glow discharge treatment of polymer surfaces [10,11];…”
Section: Introductionmentioning
confidence: 99%
“…29,30 Pioneering work has been done by the Parikh laboratory to pattern solid supported lipid bilayers using deep UV radiation. [31][32][33][34] Additionally, deep UV radiation had been employed to pattern organosilane monolayers, 35,36 polysaccharides, 37 and S-layer proteins. 38 In this paper, we extend this idea to patterning sacrificial adsorbed protein layers at the liquid/solid interface.…”
mentioning
confidence: 99%