Deep-UV patterning of commercial grade PMMA for low-cost, large-scale microfluidics

Abstract

Although PMMA can be exposed using a variety of exposure sources, deep-UV at 254 nm is of interest because it is relatively inexpensive. Additionally, deep-UV sources can be readily scaled to large area exposures. Moreover, this paper will show that depths of over 100 μm can be created in commercial grade PMMA using an uncollimated source. These depths are sufficient for creating microfluidic channels. This paper will provide measurements of the dissolution depth of commercial grade PMMA as a function of the exposure dose and etch time, using an IPA:H 2 O developer. Additionally, experiments were run to characterize the dependence of the dissolution rate on temperature and agitation. The patterned substrates were thermally bonded to blank PMMA pieces to enclose the channels and ports were drilled into the reservoirs. The resulting fluidic systems were then tested for leakage. The work herein presents the patterning, development and system behaviour of a complete microfluidics system based on commercial grade PMMA.

Investigation of wax and paper materials for the fabrication of paper-based microfluidic devices

“…Polymeric microfluidic devices can be fabricated by a variety of techniques depending on the intended applications and the equipment available (Haiducu et al 2008;Zhong et al 2010). Polymeric materials of different grades and types are easily available, and the fabrication techniques have saved time and cost compared to glass and silicon-based devices (Song et al 2004).…”

Fabrication of fluidic chips with 1-D nanochannels on PMMA substrates by photoresist-free UV-lithography and UV-assisted low-temperature bonding

“…Our previous study (Kong et al 2006) reported that PC sheets could be UV-lithographied to a depth of 130 nm using the low-pressure mercury lamp as the source. Haiducu et al (2008) also reported that exposure of PMMA sheets to UV-light from a low-pressure mercury lamp resulted in an etched pattern, the depth of which could be developed in isopropanol-water developing solution to decades of micrometers. They ) ascribed the etched depth to the physical shrinkage of the polymer due to the increase in the free volume of the PMMA chains after UV-exposure.…”

Эффект Воздействия Коротковолнового УФ Излучения При Записи Голографических Структур На Содержащих Желатин Регистрирующих Средах (Обзор)

“…Он обладает достаточно высокой чувствительностью к различного рода излу-чениям, что предопределило его широкое использова-ние как резиста для электронно-лучевой литографии и рентгеновской литографии с высоким разрешени-ем [39,40]. ПММА также применяется в качестве по-зитивного фоторезиста для коротковолнового УФ из-лучения (λ ≤ 300 nm) [41,42], т. е. в области спектра излучения ртутных ламп, которые применялись для облучения образцов в работах [36][37][38].…”