Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers

Jurek, M. J.; Novembre, Anthony E.; Heyward, I. P.; Gooden, Robert; Reichmanis, Elsa

doi:10.1021/cm00005a009

Chem. Mater.

1989

DOI: 10.1021/cm00005a009

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Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers

M. J. Jurek¹,

Anthony E. Novembre²,

I. P. Heyward³

et al.

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Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers

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