2022
DOI: 10.1080/14686996.2022.2116294
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Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept

Abstract: Micro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new process that relies on direct writing laser patterning in the Deep-UV (DUV) range to prepare photoluminescent microstructures of ZnO at room temperature, under air. This process is based on a synthesis of colloidal Zn… Show more

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Cited by 4 publications
(5 citation statements)
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References 46 publications
(29 reference statements)
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“…[15,16] Direct writing laser patterning of photoluminescent ZnO can also be achieved by DUV exposure. [17] Recently, near-infrared condensation of indium zinc oxide (IZO) has also been performed to design an H 2 S sensor. [5] Near-infrared (NIR) condensation with an NIR dye added to the solution was found to be effective in converting the xerogel into a metal oxide thin film.…”
Section: Introductionmentioning
confidence: 99%
“…[15,16] Direct writing laser patterning of photoluminescent ZnO can also be achieved by DUV exposure. [17] Recently, near-infrared condensation of indium zinc oxide (IZO) has also been performed to design an H 2 S sensor. [5] Near-infrared (NIR) condensation with an NIR dye added to the solution was found to be effective in converting the xerogel into a metal oxide thin film.…”
Section: Introductionmentioning
confidence: 99%
“…In general, even with a photoresist, it is often observed that pattern height differences decrease owing to overexposure, as in ET fog. The main reason why layers remain in the unexposed areas after overexposure is often light leakage 48 , 49 . A major cause of ET fog is also light leakage to the unexposed areas.…”
Section: Resultsmentioning
confidence: 99%
“…Reproduced under terms of the CC‐BY license. [ 70 ] Copyright 2022, Quentin Kirscher, Samar Hajjar‐Garreau, Fabien Grasset, Dominique Berling, and Olivier Soppera, published by Taylor & Francis.…”
Section: Nanoarchitectonics In Optical and Photonic Researchmentioning
confidence: 99%
“…Kirscher et al have, under the concept of nanoarchitectonics, developed a new process that relies on direct-write laser patterning in the deep UV region developed. [70] The process is based on the fabrication of photoluminescent microstructures by patterning ZnO under room temperature and atmospheric conditions (Figure 7). This is caused by the aggregation and insolubility of the ZnO nanocrystals.…”
Section: Nanoarchitectonics In Optical and Photonic Researchmentioning
confidence: 99%
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