2015
DOI: 10.1016/j.cplett.2015.08.071
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Decomposition processes of H3NBH3 (borazane), (BH)3(NH)3 (borazine), and B(CH3)3 (trimethylboron) on heated W wire surfaces

Abstract: a b s t r a c tThe decomposition mechanisms of H 3 NBH 3 , (BH) 3 (NH) 3 , and B(CH 3 ) 3 on heated W wire surfaces were examined using mass spectrometric and laser spectroscopic techniques. These chemicals can be source materials for catalytic chemical vapor deposition as well as for B-atom doping. All the species could be decomposed well when the wire temperature was over 2.0 × 10 3 K. When H 2 was introduced, the production of B atoms was confirmed in the decomposition of H 3 NBH 3 and B(CH 3 ) 3 , but not … Show more

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Cited by 4 publications
(7 citation statements)
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“…borazane, can be decomposed efficiently on hot-wire surfaces and that this can be a safer source material for B-atom doping. 3,4 NH 3 BH 3 is decomposed to NH 3 and BH 3 , while BH 3 can be converted to B atoms in gas-phase reactions with H atoms. H atoms can easily be produced from H 2 on heated wire surfaces.…”
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“…borazane, can be decomposed efficiently on hot-wire surfaces and that this can be a safer source material for B-atom doping. 3,4 NH 3 BH 3 is decomposed to NH 3 and BH 3 , while BH 3 can be converted to B atoms in gas-phase reactions with H atoms. H atoms can easily be produced from H 2 on heated wire surfaces.…”
mentioning
confidence: 99%
“…H atoms can easily be produced from H 2 on heated wire surfaces. 5,6 Although the vapor pressure of NH 3 BH 3 is low, around 0.01 Pa at room temperature, the B-atom density produced from NH 3 BH 3 can be increased up to 310 11 cm -3 by heating the NH 3 BH 3 reservoir to 350 K. This density is comparable to that produced by the catalytic decomposition of B 2 H 6 /H 2 , 4,7 and sufficient for doping to semiconductor substrates. One problem with this boron-nitrogen-hydrogen compound is the possible contamination by N atoms.…”
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