2014
DOI: 10.1016/j.cej.2014.01.048
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Decomposition of high molecular weight carboxylic acid in aqueous solution by submerged thermal plasma

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Cited by 11 publications
(6 citation statements)
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“…Formation of sebacic acid radicals also depends on the formation of hydroxyl radicals in solution as well as UV radiation during plasma processing Eqs. (8) and (9).…”
Section: Reaction Mechanismmentioning
confidence: 97%
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“…Formation of sebacic acid radicals also depends on the formation of hydroxyl radicals in solution as well as UV radiation during plasma processing Eqs. (8) and (9).…”
Section: Reaction Mechanismmentioning
confidence: 97%
“…Air and nitrogen provide a relatively high decomposition rate of contaminants with a long electrode life. However, they produce additional pollutants due to the formation of NO x [8]. Argon, as an inert gas, can also be used in any treatment.…”
Section: Introductionmentioning
confidence: 99%
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“…It can be ionized easily compared to the other plasma gases, but its low thermal conductivity and low enthalpy reduce the thermal efficiency in the treatment process [1]. Oxygen can also offer high decomposition rate of contaminants due to a high level of oxidant species [7]. However, oxygen is corrosive to electrodes making it not adequate for the treatment process.…”
Section: Introductionmentioning
confidence: 99%
“…However, they produce additional pollutants due to the formation of mono nitrogen oxides, and NO x . Therefore, decomposition process with these plasmas requires a post treatment process to remove the nitrogen containing species [7]. Argon, which is an inert gas, can also be used as plasma gas in some DC thermal plasma torches.…”
Section: Introductionmentioning
confidence: 99%