Decomposição de precursores metalorgânicos: uma técnica química de obtenção de filmes finos

Abstract

This review focus the more relevant foundations and applications of the Metallo-Organic Decomposition (MOD) technique, mainly within the last decade. The technique has grown significantly, mainly due to the good results concerning the preparation of multicomponent oxide systems with composition, structural and morphologic control, in a relatively simple way. This opened new opportunities to obtain materials with well-defined electrical and optical properties.

Yttrium aluminum garnet coating on glass substrate

“…Recent technological advances in materials science have relied on the development of thin films with application in magneto-optical devices [13]; optical windows [14]; phosphors for WLED [15], CCD cameras [16], and scintillation imaging screens [16]; thermophotovoltaic devices [17]; solar cells [18]; and waveguides [19].…”

Nb2O5 coating of glass fibres applied by chemical vapour deposition

“…1 The chemical vapour deposition technique is one of the methods most commonly used in the formation of multilayers, fine films, coatings and surface modifications. [1][2][3] This technique involves the use of precursors at high vapour pressure and moderate sublimation temperatures, among them chlorides, alkoxides and b-diketones. The CVD technique can be adapted to different precursor excitation methods, one of which consists of a plasma system coupled to a vacuum chamber.…”

“…The CVD technique can be adapted to different precursor excitation methods, one of which consists of a plasma system coupled to a vacuum chamber. 2 Another method involves the use of a UHV chamber equipped with a mass spectrometer, 3 while one of the simplest methods for using the CVD technique is a high vacuum device coupled to a heating system. 4 Both the MOD and CVD techniques can be used to obtain devices for solid phase microextraction (SPME).…”

“…– 3 This technique involves the use of precursors at high vapour pressure and moderate sublimation temperatures, among them chlorides, alkoxides and β -diketones. The CVD technique can be adapted to different precursor excitation methods, one of which consists of a plasma system coupled to a vacuum chamber 2. Another method involves the use of a UHV chamber equipped with a mass spectrometer,3 while one of the simplest methods for using the CVD technique is a high vacuum device coupled to a heating system 4.…”

Um procedimento simples e barato para a construção de um equipamento "dip-coating" para deposição de filmes em laboratório

“…A obtenção de materiais na forma de filmes finos corresponde a um desafio científico e tecnologicamente importante, uma vez que filmes sólidos apresentam uma infinidade de aplicações nos mais diferenciados dispositivos 1 . Filmes podem ser depositados através de uma grande variedade de técnicas, que podem ser classificadas de acordo com a fase do meio contendo seu precursor.…”