2020
DOI: 10.1109/tns.2019.2956760
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Data-Retention-Voltage-Based Analysis of Systematic Variations in SRAM SEU Hardness: A Possible Solution to Synergistic Effects of TID

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Cited by 12 publications
(6 citation statements)
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“…Kobayashi et al [7] and Cannon et al [10] demonstrated that V DR enables one to extract a zero-time variation in σ between cells due to inherent variability in the fabrication process. Kobayashi et al [6] showed its usefulness in monitoring and canceling a gradual postfabrication change in σ due to total ionizing dose (TID) fatigue [6]. The convergence observed in Fig.…”
Section: A Derivation From Findings In Our Previous Studymentioning
confidence: 97%
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“…Kobayashi et al [7] and Cannon et al [10] demonstrated that V DR enables one to extract a zero-time variation in σ between cells due to inherent variability in the fabrication process. Kobayashi et al [6] showed its usefulness in monitoring and canceling a gradual postfabrication change in σ due to total ionizing dose (TID) fatigue [6]. The convergence observed in Fig.…”
Section: A Derivation From Findings In Our Previous Studymentioning
confidence: 97%
“…Fig. 1 shows the starting material for modeling, which was reported in our previous silicon-on-insulator (SOI) SRAM study [6], [7]. The part examined here consists of a standard SRAM cell based on a 65-nm process, not supported by radiation hardening by design (RHBD).…”
Section: A Derivation From Findings In Our Previous Studymentioning
confidence: 99%
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“…SRAM σ measured under various L and V DD conditions were supposed to converge on the point P where V DD = V DR . Measurement data were taken from heavy-ion tests with the 65-nm SOI SRAM [12], [15].…”
Section: Review Of the Original Derivationmentioning
confidence: 99%