Damage-Free Photoemission Study of Conducting Carbon Composite Electrode Using Ar Gas Cluster Ion Beam Sputtering Process

Yun, Dong‐Jin; Jung, Chang Won; Lee, Hyung-Ik; Kim, Ki Hong; Kyoung, Yong Koo; Benayad, Anass; Chung, Jae-Yong

doi:10.1149/2.011207jes

Cited by 39 publications

(58 citation statements)

References 21 publications

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“…There is also a very small peak at 291.1 eV, indicating the presence of π−π* transitions in the MWCNTs and PEDOT:PSS molecules. 24 Compared to the as-dep one, both methanol and HCl−met treated PEDOT:PSS films have slightly higher peak area in the CO and CS compared to the main asymmetric peaks of CC and CC bonding. Similarly, the chemical structures in the O 1s and S 2p core-levels present completely equivalent transition behaviors according to the methanol and HCl−met treatments.…”

Section: Resultsmentioning

confidence: 92%

Effective Way To Enhance the Electrode Performance of Multiwall Carbon Nanotube and Poly(3,4-ethylenedioxythiophene): Poly(styrene sulfonate) Composite Using HCl–Methanol Treatment

Yun

Jeong

et al. 2016

J. Phys. Chem. C

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In this study, the electrode performance of composite films composed of highly conductive multiwalled carbon nanotubes (MWCNTs) and poly(3,4-ethylenedioxythiophene) polymerized with poly(4-styrenesulfonate) (PE-DOT:PSS) are improved with the use of HCl−methanol (HCl−met) treatment. The HCl−met treatment affects film properties, including surface morphology, optical transmittance, work function (Φ), and electrical conductivity, which are investigated using various kinds of MWCNT/ PEDOT:PSS composite systems. As a result of the HCl−met treatment, all MWCNT/PEDOT:PSS films undergo considerable changes in molecular ratio and arrangement between PEDOT and PSS, but their MWCNTs have no chemical/ structural transitions. This in turn enhances the electrical conductivity and catalytic activity of the MWCNT/PEDOT:PSS films without changing their other properties. Furthermore, because of these effects, the HCl−met treatment brings about noticeable enhancements in performance as the source/drain electrode in an organic thin-film transistor and as the catalytic counter electrode in a dye-sensitized solar cell.

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Section: Resultsmentioning

confidence: 92%

Effective Way To Enhance the Electrode Performance of Multiwall Carbon Nanotube and Poly(3,4-ethylenedioxythiophene): Poly(styrene sulfonate) Composite Using HCl–Methanol Treatment

Yun

Jeong

et al. 2016

J. Phys. Chem. C

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“…More and more organic electronic devices, including organic thin-lm transistors (OTFTs), organic photovoltaics (OPVs), dye-sensitized solar cells (DSSCs), and organic light-emitting diodes (OLEDs), increasingly require highly functionalized organic materials to replace the inorganic or metal component because of low cost and simple processing. [5][6][7] Until now, ultraviolet photoemission spectroscopy (UPS) and X-ray photoemission spectroscopy (XPS) have been most commonly used to characterize the chemical bonding states, orientations, and compositions of the surface regions of organic/inorganic materials. Therefore, numerous difficulties are encountered while using conventional processes to characterize the physical/chemical composition and other properties of organic-based materials, 5,6 and argon-ion-sputtering-induced damage to the chemical/electrical states of organic materials is a typical example.…”

Section: Introductionmentioning

confidence: 99%

“…[5][6][7] Until now, ultraviolet photoemission spectroscopy (UPS) and X-ray photoemission spectroscopy (XPS) have been most commonly used to characterize the chemical bonding states, orientations, and compositions of the surface regions of organic/inorganic materials. 5,6 However, despite advantages such as high sputtering yield, low cost, and ease of control, Ar ion sputtering degrades or destroys the surface chemical bonding of some materials and can signicantly skew the chemical state or the atomic composition of organic materials in particular. 8,9 Therefore, most photoemission spectroscopy (PES) equipments use argon (Ar) ion sputtering depth proling to study the chemical state of the bulk region.…”

Section: Introductionmentioning

confidence: 99%

“…[7][8][9] The properties of the surface region of most materials are different from those of the bulk because of contamination, chemical reactions, dangling bonds, and exposure to the environment or air. [5][6][7] The degradation of organic materials has been signicantly reduced with the recent introduction of the Ar gas cluster ion beam (Ar GCIB) sputtering system, thereby enabling PES to be used in order to study the bulk, interface, and surface properties of organic materials. 5,6 However, despite advantages such as high sputtering yield, low cost, and ease of control, Ar ion sputtering degrades or destroys the surface chemical bonding of some materials and can signicantly skew the chemical state or the atomic composition of organic materials in particular.…”

Section: Introductionmentioning

confidence: 99%

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Study on the molecular distribution of organic composite films by combining photoemission spectroscopy with argon gas cluster ion beam sputtering

et al. 2015

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X-ray/ultraviolet photoelectron spectroscopy (XPS/UPS) and argon gas cluster ion beam (GCIB) sputtering were combined to directly study the molecular configurations of organic composite films consisting of more than two different materials. In contrast to Ar ion sputtering, Ar GCIB sputtering does not critically distort the chemical states and atomic compositions of organic materials, thereby enabling the chemical structures of uncontaminated bulk regions and air-exposed surface regions of organic materials to be precisely examined. Using this combination, the molecular configurations of single-wall and multiwall carbon nanotube (SWNT and MWCNT) films, composed of corresponding CNTs and surfactants, could be specifically characterized based on the chemical state transitions in the C 1s core level depth profiles.Further, the XPS/UPS spectra showed variations in the chemical states with increasing sputtering time, which were fully consistent with the surface morphologies observed in the high-resolution atomic force microscopy and high-resolution secondary electron microscopy images. Hence, we believe that combining XPS/UPS with Ar GCIB sputtering can be an excellent method for investigating the molecular distributions of organic composite films. Fig. 1 HR-SEM images of cross-sections and morphologies of asdeposited SWNT (a) and (b) and MWCNT (c) and (d) films, respectively.This journal is

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“…The Ar GCIB sputtering process did not cause any variation in the primary valence band structure including the chemical state and the configuration of pentacene/PEDOT:PSS and pentacene/Au. The Ar GCIB sputtering is a damage-free process for organic thin films [6,7]. In our previous work, we applied GCIB sputtering to measure the damage profile on Si (100) surfaces [8].…”

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confidence: 99%

Applications of Ar Gas Cluster Ion Beam to Oxide Thin Films

Park

Chae

Park

et al. 2015

JSA

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The electronic structure of a Ta 2 O 5 thin film on SiO 2 /Si (100) after Ar Gas Cluster Ion Beam (GCIB) sputtering was investigated using X-ray photoemission spectroscopy and compared with those obtained via mono-atomic Ar ion beam sputtering. The Ar ion sputtering had a great deal of influence on the electronic structure of the oxide thin film. Ar GCIB sputtering without sample rotation also affected the electronic structure of the oxide thin film. However, Ar GCIB sputtering during sample rotation did not exhibit any significant transition of the electronic structure of the Ta 2 O 5 thin films. Ar GCIB can be useful for potential applications of oxide materials with sample rotation. 1．IntroductionIon beam sputtering has been widely used in secondary ion mass spectrometry (SIMS), X-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES) for depth profiling or surface cleaning. One of the drawbacks of ion beam sputtering is an induced matrix effect such as surface segregation, surface composition change and surface damage, which causes difficulties in characterization of organic/inorganic interfaces and oxide materials [1,2]. Therefore, the surface matrix effects caused by ion beam sputtering should be minimized to use facile surface analysis. C 60 ion sputtering has been used for low damage surface cleaning and depth profiling of many organic materials, but the depth profiling of organic has not been successful because of a composition change due to preferential sputtering as well as degradation of chemical states of C 1s, N 1s, and O1s [3]. Recently, Ar GCIB has attracted a lot of attention as a promising method for depth profiling of organic thin films due to extremely low degradation of surface during depth profiling [4,5]. The effects of an Ar GCIB sputtering process on the structural and chemical properties of an organic material as well as the energy level alignment at the interface between the organic semiconductor and the electrode were studied. The molecular structure and the orientation of pentacene stayed the same after the Ar GCIB process. Furthermore, there was no change in the chemical bonding states in the organic materials including pentacene and poly (3, 4-ethylene dioxy thiophene) polymerized with poly (4-styrene sulfonate) (PEDOT: PSS). The Ar GCIB sputtering process did not cause any variation in the primary valence band structure including the chemical state and the configuration of pentacene/PEDOT:PSS and pentacene/Au. The Ar GCIB sputtering is a damage-free process for organic thin films [6,7]. In our previous work, we applied GCIB sputtering to measure the damage profile on Si (100) surfaces [8]. The damage thickness was about 10 nm, 6.4 nm and 4.2 nm for 20, 10, and 5 keV Ar GCIB sputtering, respectively. We also applied Ar GCIB sputtering to SiO 2 thin films [9]. The Ar GCIB sputtering at surface normal incidence had a deal of influence on the surface potential and the chemical structure of a SiO 2 thin film. However, the Ar GCIB sputtering at the grazing incidence...

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Damage-Free Photoemission Study of Conducting Carbon Composite Electrode Using Ar Gas Cluster Ion Beam Sputtering Process

Cited by 39 publications

References 21 publications

Effective Way To Enhance the Electrode Performance of Multiwall Carbon Nanotube and Poly(3,4-ethylenedioxythiophene): Poly(styrene sulfonate) Composite Using HCl–Methanol Treatment

Effective Way To Enhance the Electrode Performance of Multiwall Carbon Nanotube and Poly(3,4-ethylenedioxythiophene): Poly(styrene sulfonate) Composite Using HCl–Methanol Treatment

Study on the molecular distribution of organic composite films by combining photoemission spectroscopy with argon gas cluster ion beam sputtering

Applications of Ar Gas Cluster Ion Beam to Oxide Thin Films

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