Despite
the enormous potential of the single-crystalline two-dimensional
(2D) materials for a wide range of future innovations and applications,
2D single-crystals are still suffering in industrialization due to
the lack of efficient large-area production methods. In this work,
we introduce a general approach for the scalable growth of single-crystalline
graphene, which is a representative 2D material, through “transplanting”
uniaxially aligned graphene “seedlings” onto a larger-area
catalytic growth substrate. By inducing homoepitaxial growth of graphene
from the edges of the seeds arrays without additional nucleations,
we obtained single-crystalline graphene with an area four times larger
than the mother graphene seed substrate. Moreover, the defect-healing
process eliminated the inherent defects of seeds, ensuring the reliability
and crystallinity of the single-crystalline graphene for industrialization.