2002
DOI: 10.1109/lpt.2002.1021959
|View full text |Cite
|
Sign up to set email alerts
|

CW operation and threshold characteristics of all-monolithic InAlGaAs 1.55-μm VCSELs grown by MOCVD

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
14
0

Year Published

2003
2003
2012
2012

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 39 publications
(14 citation statements)
references
References 11 publications
0
14
0
Order By: Relevance
“…Used VCSELs at wavelength of 1500 nm are fabricated with different technologies [5,6,7,8,9,10,11,12]. VCSEL devices developed using the wafer fusion method have achieved continuous wave at wavelength of 1500 nm at power, threshold voltage and current about 0.65 mW, 2.5 V and 1 mA respectivel [13].…”
Section: Introductionmentioning
confidence: 99%
“…Used VCSELs at wavelength of 1500 nm are fabricated with different technologies [5,6,7,8,9,10,11,12]. VCSEL devices developed using the wafer fusion method have achieved continuous wave at wavelength of 1500 nm at power, threshold voltage and current about 0.65 mW, 2.5 V and 1 mA respectivel [13].…”
Section: Introductionmentioning
confidence: 99%
“…1. The homemade VCSEL was fabricated with a one-step low-pressure metal-organic chemical vapor deposition technique [23], [24]. The active region was formed by seven pairs of monolithic strain-compensated InGaAs quantum wells (QWs).…”
Section: Methodsmentioning
confidence: 99%
“…In addition, recently the selective anodic oxidation of AlInN over GaN has been demonstrated [68]. Possible candidates for the realisation of high refractive index contrast DBRs in the 1550 nm telecom wavelength range are the oxides of AlAsSb [69][70][71][72], InAlAs [73][74][75][76][77] and AlInAsP [78], all lattice-matched to InP. However, to our knowledge, no MCLEDs with oxide DBRs of this type have been realised so far.…”
Section: Featurementioning
confidence: 99%