2021
DOI: 10.1016/j.diamond.2021.108333
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CVD synthesis of multi-layered polycrystalline diamond films with reduced roughness using time-limited injections of N2 gas

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Cited by 19 publications
(7 citation statements)
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“…[34] In viewing of the progress of diamond growth and micromachining technologies, different diamond forms such asMCD, NCD, UNCD, and SCD were developed to fabricate diamond MEMS devices. [14,[35][36][37][38][39][40][41][42]…”
Section: Microfabrication Of Diamond Memsmentioning
confidence: 99%
“…[34] In viewing of the progress of diamond growth and micromachining technologies, different diamond forms such asMCD, NCD, UNCD, and SCD were developed to fabricate diamond MEMS devices. [14,[35][36][37][38][39][40][41][42]…”
Section: Microfabrication Of Diamond Memsmentioning
confidence: 99%
“…Polycrystalline diamond coating with alternating layers with micro-and nanostructure (MCD/NCD) was grown in a microwave (2.45 GHz) plasma CVD reactor ARDIS-100 (Optosystems, Moscow, Russia) [31,32]. The lower layer of the coating was grown in a mode that ensures the growth of the microcrystalline diamond fraction for 10 min for the reliable formation of diamond nuclei from the deposited layers of diamond particles seed [33] in a methane/hydrogen gas mixture with a methane concentration of 4% at a substrate temperature of 850 • C. Then, a multilayer polycrystalline diamond film was formed by periodic nitrogen injection, which ensures the growth of the nanocrystalline fraction [34], reducing the overall roughness of the coating surface. The total deposition time was 6 h with an average growth rate of ~1 µm/h.…”
Section: Tool Coatingsmentioning
confidence: 99%
“…It is well known that secondary nucleation processes can be stimulated by small additions of nitrogen [28,41]. Using cyclic small additions of nitrogen, it is possible to reduce the relative roughness of diamond coatings by more than three times and, at the same time, maintain the overall high quality and phase purity of the material [42]. Another main factor affecting this process is the content of methane in the reaction gas mixture: high concentrations stimulate secondary nucleation [43][44][45][46] and lead to the formation of NCD films.…”
Section: Introductionmentioning
confidence: 99%