CVD of Nanoporous Silica

Senkevich, Jay J.

doi:10.1002/(sici)1521-3862(199912)5:6<257::aid-cvde257>3.0.co;2-j

Cited by 6 publications

(1 citation statement)

References 8 publications

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“…Further, after the 250 °C anneal, a small peak begins to develop at 1781 cm −1 , which is more indicative of a cyclic strained ester due to the increase in bond energy of the carbonyl peak. This peak is similar to the one found when parylene C was used as a sacrificial material to fabricate CVD nanoporous SiO 2 thin films 15. In that previous study, a peak at 1790 cm −1 was evident after oxidation at 300 °C for 30 min.…”

Section: Oxidation Of Parylene N and X As A Function Of Temperaturesupporting

confidence: 85%

DFG‐Fachkollegienwahl 2007

2008

Nachr Chem

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Section: Oxidation Of Parylene N and X As A Function Of Temperaturesupporting

confidence: 85%

DFG‐Fachkollegienwahl 2007

2008

Nachr Chem

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Thermal Oxidation of Parylene X

Senkevich

2011

Chemical Vapor Deposition

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Up until recently the only parylene polymers that existed were linear chain polymers, the most common of which are poly( p-xylylene) (parylene N) and poly(chloro-p-xylylene) (parylene C). Both of these polymers have a strong sensitivity towards oxygen and UV light in the presence of oxygen. They are both reactive towards oxygen and subsequently lose mass via chain scission, however cross-linked or networked polymers have much different degradation mechanisms since chain scission is not readily available due to the connectivity of the polymer chains. In this study it is observed that poly(ethynyl-p-xylylene)-copoly( p-xylylene) (parylene X) is stable to 300 8C in air for one hour after a 1 h post-deposition vacuum anneal at 380 8C, whereas parylene N is stable to just 200 8C for 1 h in air under the same conditions, for 1705 Å and 1826 Å thin films, respectively. After 1000 h at 150 8C in air, parylene X loses little if no film thickness (<0.2%), whereas parylene N loses 7%; however, chain scission is initiated in the parylene X thin films at 362 h. Chain scission is also observed with the birefringence data and in the infrared spectroscopy spectra. The data do not suggest parylene X is more stable than parylene N, but rather its degradation mechanism is much different due to its networked structure, which may have implications for its thermo-mechanical properties. Infrared spectroscopic and ellipsometric data will be presented as a function of time and temperature for both the aforementioned polymers.

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CVD of Poly(α,α′‐dimethyl‐p‐xylylene) and Poly(α,α,α′,α′‐tetramethyl‐p‐xylylene)‐co‐poly(p‐xylylene) from Alkoxide Precursors II: Thermal Oxidative Stability

Senkevich

2011

Chemical Vapor Deposition

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The Achilles heel of the parylene polymers is their oxidative stability at room temperature with UV exposure and at elevated temperature >115 8C in air. This weakness is attributed to the aliphatic carbon-carbon single bond in the main-chain backbone. Fluorinating this chemistry helps the oxidation substantially, but the precursor then becomes nearly prohibitive to use due to cost of the precursor and the processing cost. Another option is to explore the methylation of this benzyl position. Poly(a,a 0 -dimethyl-p-xylylene) and poly(a,a,a 0 ,a 0 -tetramethyl-p-xylylene)-co-poly( p-xylylene) are deposited on the parylene platform via alkoxy precursors. Their oxidation as a function of temperature to 300 8C; and time at 150 8C is explored via variable angle spectroscopic ellipsometry (VASE) and infrared spectroscopy (IRS). Results show very little difference between the two polymers as a function of oxidation temperature, and better results compared to what was previously observed with the poly( pxylylene) homopolymer, however the oxidation of poly(a,a 0 -dimethyl-p-xylylene) at 150 8C as a function of time is less positive with 16% thickness loss over 1000 h with the post-deposition annealed sample.

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CVD of Nanoporous Silica

Cited by 6 publications

References 8 publications

DFG‐Fachkollegienwahl 2007

DFG‐Fachkollegienwahl 2007

Thermal Oxidation of Parylene X

CVD of Poly(α,α′‐dimethyl‐p‐xylylene) and Poly(α,α,α′,α′‐tetramethyl‐p‐xylylene)‐co‐poly(p‐xylylene) from Alkoxide Precursors II: Thermal Oxidative Stability

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