Curvature determination of embedded silicon chips byin siturocking curve X-ray diffraction measurements at elevated temperatures

Abstract

The deflection (curvature) of embedded single-crystal silicon chips was investigated by rocking curve X-ray diffraction techniques at two significant manufacturing stages in the process chain of printed circuit boards with embedded components. An overview of the curvature deduction by two different approaches was presented: (1) the measurement of the variation of the rocking curve maximum as a function of the lateral sample position along a specific traverse; the slope in such a diagram is then proportional to the corresponding curvature in that direction. (2) The evaluation of the rocking curve width; here the peak width is inversely proportional to the curvature at known beam diameter, diffraction angle, and beam divergence. It was shown that the rocking curve method is applicable to determine the curvature inside single crystalline chips. Furthermore, the method is also suitable to determine the curvature of fully embedded or encapsulated chips. Additionally the absorption of the radiation in the embed medium was quantitatively discussed. The curvature of two different prepared samples was determined at temperatures up to 200 °C in a heating stage attached to the diffractometer device.

Thermomechanical and Creep Behaviors of Multilayered Metallization Systems Developed for High‐Temperature Surface Acoustic Wave Sensors

“…Measuring film strain using X-ray diffraction is another method that is suitable for a single-layer film and needs much time and expertise. [23,24] The curvature measurement with optical interferometry is another method that is suitable in the case that the curvature is large enough, and when special measurement equipment is not available. [21] Scanning the film surface with an optical laser beam and measuring the reflected beam deflections is a solution for the above-mentioned limitations which gives an accurate in situ measurement of the film-substrate curvature during the deposition and at high temperatures.…”