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1996
DOI: 10.1007/bf01567646
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Current transport in Pd2Si/n-Si(100) Schottky barrier diodes at low temperatures

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Cited by 61 publications
(95 citation statements)
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“…As the doping concentration of n-Si is 10 15 cm −3 , we can safely rule out direct tunneling, as the calculated width of the depletion layer, W d (>1 µm) is too large at RT 15 . For a better understanding of the transport characteristics, we also perform temperature dependence of I-V for both diodes.…”
Section: Resultsmentioning
confidence: 94%
“…As the doping concentration of n-Si is 10 15 cm −3 , we can safely rule out direct tunneling, as the calculated width of the depletion layer, W d (>1 µm) is too large at RT 15 . For a better understanding of the transport characteristics, we also perform temperature dependence of I-V for both diodes.…”
Section: Resultsmentioning
confidence: 94%
“…The deviation from the TE model observed in the I-V characteristics could be quantitatively explained by the TE mechanism with a Gaussian distribution of the Barrier heights [24]. Hence, we investigated temperature-dependent I-V measurements on Pd/ZnO SBD in the 30-300 K temperature range and determined the Richardson constant that is closer to the theoretical value n-ZnO using the modified plot.…”
Section: Introductionmentioning
confidence: 95%
“…where and are the apparent ideality factor and apparent barrier height at zero bias, respectively, given by [24,28], (10) and…”
Section: Barrier Height Inhomogeneitiesmentioning
confidence: 99%
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“…Contaminants due to undesirable reaction products at the MS interface may act directly to introduce inhomogeneties or they may simply promote inhomogeneity through the generation of defects [8]. Schottky diodes with low SBH have found applications in devices operating at cryogenic temperatures as infrared detectors and sensors in thermal imaging [9,10,11,12]. Therefore, analysis of I-V characteristics of Schottky diodes at room temperature only does not give detailed information about their conduction process or the nature of barrier formation at the MS interface.…”
Section: Introductionmentioning
confidence: 99%