1984
DOI: 10.1109/tns.1984.4333286
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Current Status of the Micro Channel Plate

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Cited by 17 publications
(5 citation statements)
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“…The spatial temperature distribution from the electrical contact at the edge of MCP outward to the exposed area of the MCP was modeled by Matsuura et al [] for various MCP resistances. A 10 MΩ MCP with 1000 V applied was calculated to be ~20 C higher in the exposed area than at the edge clamp.…”
Section: Mcp Resistance Versus Temperaturementioning
confidence: 99%
“…The spatial temperature distribution from the electrical contact at the edge of MCP outward to the exposed area of the MCP was modeled by Matsuura et al [] for various MCP resistances. A 10 MΩ MCP with 1000 V applied was calculated to be ~20 C higher in the exposed area than at the edge clamp.…”
Section: Mcp Resistance Versus Temperaturementioning
confidence: 99%
“…The saturation of MCP gain is a well-known phenomena, and the most dominant mechanism is attributed to the accumulation of space charges due to uncanceled electron current toward the output end of the capillaries. 22) Kikuchi et al reported a calibration method for the saturation of the MCP gain. 19) According to their report, the secondary electron amplification gain G is divided into two parts as…”
Section: Conversion Of Luminosity To Ion Numbermentioning
confidence: 99%
“…While the MCP has a very high sensitivity, its gain starts to degrade once the output current exceeds 5 -10% of the strip current. [55][56][57][58] The magnitude of an output signal is then not proportional to the total number of incident ions. The MCP is, therefore, suitable for measuring thin plasmas.…”
Section: Detectorsmentioning
confidence: 99%