2008
DOI: 10.1002/ppap.200700160
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Current Distribution on the Substrate in a Vacuum Arc Deposition Setup

Abstract: The effect of a magnetic field generated by a planar magnetron on the ion current distribution on the substrate has been investigated as a function of the substrate voltage and gas pressure for two configurations of the magnetic field. The probe and the substrate were biased by negative potentials of −60 to −280 V with respect to the grounded anode, in order to collect the saturated ion current and investigate the influence of the magnetron magnetic field on the distribution of the ion flux of the vacuum arc s… Show more

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Cited by 23 publications
(4 citation statements)
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“…В проведених раніше дослідженнях було показано, що для отримання наноструктури у приповерхневому шарі при іонно-плазмовій обробці, необхідне створення певних умов [19]. Наприклад, при обробці алюмінію іонами азоту з енергією 800 еВ було досягнуто температур порядку 600-700 К [20].…”
Section: авіаційно-космічна техніка і технологія 2022 № 5(183)unclassified
“…В проведених раніше дослідженнях було показано, що для отримання наноструктури у приповерхневому шарі при іонно-плазмовій обробці, необхідне створення певних умов [19]. Наприклад, при обробці алюмінію іонами азоту з енергією 800 еВ було досягнуто температур порядку 600-700 К [20].…”
Section: авіаційно-космічна техніка і технологія 2022 № 5(183)unclassified
“…Besides, the following important assumptions were adopted in our model: (1) the ion kinetic energy is above zero at the border of the potential well, and (2) ion collisions are negligible in the pressure range considered. 19,20 Thus, the ion path is a straight line between the potential wells. The ion path before entering (y kb ), inside (y t ), and after leaving the well are sketched in Fig.…”
Section: 46mentioning
confidence: 99%
“…The application of an additional magnetic field to enhance the ion flux and affect the distribution of the ion current density over the substrate was reported. [18][19][20] In this case, the magnetic field generated by additional electromagnetic coils placed under the substrate interacts with the field generated by the focusing and guiding coils.…”
Section: Introductionmentioning
confidence: 99%
“…The principal difference from the well-known gas-thermal methods (plasma, detonation, gas-flame, etc.) is that the main energy source in the coating processes is the kinetic energy of not relatively light-weighted ions, atoms, or molecules [16], but of heavy high-velocity solid particles, which are the clusters of the material. The physical mechanism of CS coating is a high-velocity deformation of particles on impact, which causes intensive shear instability of the material along the contact boundaries and formation of adhesive-cohesive bonds [17].…”
Section: Introductionmentioning
confidence: 99%