2005
DOI: 10.1016/j.polymer.2005.09.053
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Cure profiles, crosslink density, residual stresses, and adhesion in a model epoxy

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Cited by 44 publications
(28 citation statements)
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“…Consequently, more fluctuations in the molecular structure were generated, and the rate of expansion increased upon heating. However, as previously reported [12][13][14], increasing the filler content decreases the free volume content. Hence, the The left micrographs (a, c, e, g) are taken at 9500 magnification, and the right micrographs (b, d, f, h) are taken at 92,000 magnification space for expansion of the polymer decreases, and the CTEs of the composites are further decreased.…”
Section: Coefficient Of Thermal Expansion (Cte)supporting
confidence: 73%
“…Consequently, more fluctuations in the molecular structure were generated, and the rate of expansion increased upon heating. However, as previously reported [12][13][14], increasing the filler content decreases the free volume content. Hence, the The left micrographs (a, c, e, g) are taken at 9500 magnification, and the right micrographs (b, d, f, h) are taken at 92,000 magnification space for expansion of the polymer decreases, and the CTEs of the composites are further decreased.…”
Section: Coefficient Of Thermal Expansion (Cte)supporting
confidence: 73%
“…This can be attributed largely to the interaction between water and the system's adsorption sites (i.e. hydroxyl group, amino group, polymer chain end), which fills the gaps between polymer chains [21]. The polymerization of AH Plus occurs through the action of its polyamine monomers (1-adamantane amine, N,N'-dibenzyl-5-oxanonandiamine-1,9, TCD-Diamine).…”
Section: Discussionmentioning
confidence: 99%
“…These results are consistent with typical water absorption levels of cured epoxy adhesives. 43,44 Hydrolytic Stability of Different Off-Stoichiometry Thiolene-epoxy Thermosets Compared with Stoichiometric Thiol-ene As shown in Figures 12 and 13 the mechanical properties of the thiol-ene-epoxy networks are less affected by ester hydrolysis than the stoichiometric thiol-ene network. After 4 days in water at 85 C the stoichiometric thiol-ene network shows a 86% reduction in storage modulus at 25 C [ Fig.…”
Section: Stability and Curing Behavior During The First Curingmentioning
confidence: 98%