Cure kinetics for the ultraviolet cationic polymerization of cycloliphatic and diglycidyl ether of bisphenol‐A (DGEBA) epoxy systems with sulfonium salt using an auto catalytic model

Abstract

This paper investigates the cure kinetics for the ultraviolet (UV) cationic polymerization for both a cycloaliphatic and diglycidyl ether of bisphenol-A (DGEBA) epoxy system, using the photoinitiator triarylsulfonium hexafluoroantimonate salt. Using an autocatalytic kinetic cure model, the reaction rate values for both cycloaliphatic and DGEBA epoxy systems were determined for different photoinitiator amount (wt %) added, and at different UV exposure temperatures. The value for the cycloaliphatic epoxy increased significantly with addition of the sulfonium salt, reaching a limiting maximum after 2%. The value for the DGEBA epoxy system also increased, to a limiting maximum after 3%. Addition of the sulfonium salt significantly lowered the activation energy for the cycloaliphatic epoxy at all levels of addition, with the reduction proportional to the amount of salt added. In contrast, the sulfonium salt did not have a major effect on the DEGBA until the addition of at least 3% of the salt.

Kinetics of Cationic Photopolymerizations of UV‐Curable Epoxy‐Based SU8‐Negative Photoresists With and Without Silica Nanoparticles

“…In general, the frequency factor A is called the collision factor, and normally an increase in the rate of the reaction should be reflected in an increase in the collision factor. [33] Our observations are consistent with this expectation. The values of the frequency factor in Table 4 indicate that formulation C exhibited a greater reactivity than formulation A, which is due to the aforementioned synergistic effect of silica nanoparticles on the cationic photopolymerization reactivity of the hybrid organic-inorganic epoxy-based negative photoresist.…”

Inhibition effect of N,N-diglycidyl-4-glycidyloxy aniline on photosensitized cationic polymerization of formulations involving resorcinol diglycidyl ether and poly(propylene glycol)diglycidyl ether

“…Since the value of R p max is observed after a certain time of initiation, the autocatalytic model is extensively used for analyzing such systems [18,19,25]. The model is expressed as…”

Characterization by IR spectroscopy of an hybrid sol–gel material used for photonic devices fabrication

“…Epoxy groups are good candidates because of their low shrinkage under polymerization and their good adherence on various substrates [7]. We choose the 2-(3,4-epoxycyclohexylethyltrimethoxysilane) (EETMOS) because of its very important reactivity and its high conversion rate [8].…”