2009
DOI: 10.1108/13552540910925072
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Cure depth control for complex 3D microstructure fabrication in dynamic mask projection microstereolithography

Abstract: Purpose -The paper's aim is to explore a method using light absorption for improving manufacturing of complex, three-dimensional (3D) micro-parts with a previously developed dynamic mask projection microstereolithography (MSL) system. A common issue with stereolithography systems and especially important in MSL is uncontrolled penetration of the ultraviolet light source into the photocrosslinkable resin when fabricating down-facing surfaces. To accurately fabricate complex 3D parts with down-facing surfaces, a… Show more

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Cited by 122 publications
(94 citation statements)
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“…This presents a new approach to solving this problem while building on previous research which focused mainly on improvements in hardware [8,9] and resin chemistry [6,7]. Future work will include the creation of an STL file modification program.…”
Section: Discussionmentioning
confidence: 99%
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“…This presents a new approach to solving this problem while building on previous research which focused mainly on improvements in hardware [8,9] and resin chemistry [6,7]. Future work will include the creation of an STL file modification program.…”
Section: Discussionmentioning
confidence: 99%
“…Most recently Tumbleston et al [9] made improvements to SL DLP hardware by introducing an oxygen permeable build platform which inhibits polymerization and enables 'layerless' fabrication at faster build speeds. A second more widely researched approach involves altering the SL resin material with a chemical light absorber [6][7][8]. In this work we develop a third approach in mitigating for the overcuring effect by simulating the process and predicting the level of overcuring likely to occur.…”
Section: Introductionmentioning
confidence: 99%
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“…Vector-by-vector µSL, also referred to as scanning µSL, uses a scanning focused laser beam (Ikuta and Kirowatari 1993;Zissi et al 1996;Sun and Zhang 2002;Lee et al 2007. Integral µSL, also referred to as projection µSL, projects a 2D image onto the resin from a dynamic mask (Bertsch et al 1997(Bertsch et al , 2001(Bertsch et al , 2004Sun et al 2005;Choi et al 2006Choi et al , 2009aLimaye and Rosen 2007;Ha et al 2008;Han et al 2008).…”
Section: Dynamic Mask Microstereolithography (µSl)mentioning
confidence: 99%
“…In this work, a Digital Micromirror Device (DMD)-based µSL system was used to produce the sleeve with the micro-vanes (Choi et al 2009a(Choi et al , b, 2010. Figure 1 shows the µSL system, which consists of an OmniCure™ S2000 as a light source with an output of 200 W, a collimating lens, and an optical fiber (EXFO Co., Canada); a DMD with ∼780,000 micromirrors with the size of 13.68 µm (DMD Discovery™ 1100 Controller board and Starter Kit, Texas Instruments, USA); a tube lens with a focal length of 120 mm (Achromat doublet lens, MellesGriot Co. USA); an aluminum-coated reflecting mirror; a focusing unit (IM-4, Nikon Co., Japan); an objective lens (CFI Plan Flour 4×, Nikon Co., USA); a motor-driven linear Z-stage with a resolution of 1 µm (ATS100-050, Aerotech, USA); and a stainless steel resin vat.…”
Section: Dynamic Mask Microstereolithography (µSl)mentioning
confidence: 99%