2015
DOI: 10.1016/j.jlumin.2014.10.058
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Cuprous oxide thin films prepared by thermal oxidation of copper layer. Morphological and optical properties

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Cited by 29 publications
(20 citation statements)
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“…Methods such as electrochemical deposition [27,28] and sol-gel methods [29,30] can simplify the processing; yet they require hazardous or expensive solutions, respectively. Thermal oxidation methods [31,32] can provide a simple bottom-up approach of forming copper oxide nanostructures on a copper substrate. However, they require vacuum conditions and still cannot easily generate film-free nanostructures directly on the Cu (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Methods such as electrochemical deposition [27,28] and sol-gel methods [29,30] can simplify the processing; yet they require hazardous or expensive solutions, respectively. Thermal oxidation methods [31,32] can provide a simple bottom-up approach of forming copper oxide nanostructures on a copper substrate. However, they require vacuum conditions and still cannot easily generate film-free nanostructures directly on the Cu (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…4Cu + O2 → 2Cu2O (12) 2Cu2O + O2 → 4CuO (13) Thermal oxidation of copper, is an attractive technique due to its simplicity, highquality and low-cost, nevertheless it is a time consuming route [374]. Besides thermal oxidation, several other techniques have been used to produce copper oxides, including hydrothermal synthesis [367,375], microwave irradiation [376] and microwave oxidation [11], sol-gel method [377,378], spray pyrolysis [25,379], electrodeposition [380,381], sputtering [382,383], among others.…”
Section: Tungsten Trioxidementioning
confidence: 99%
“…For the formation of copper and copper oxides several methods have been applied including electrochemical deposition,, thermal oxidation of copper, magnetron sputtering, spin‐coating, chemical beam epitaxy (CBE), atomic layer deposition (ALD), and chemical vapor deposition (CVD) , , …”
Section: Introductionmentioning
confidence: 99%
“…media, [15] solar cells, [16] sensors, [17] batteries, [18,19] and catalysis. [20][21][22] For the formation of copper and copper oxides several methods have been applied including electrochemical deposition, [23,24] thermal oxidation of copper, [25] magnetron sputtering, [26] spin-coating, [27][28][29][30][31] chemical beam epitaxy (CBE), [32] atomic layer deposition (ALD) [6,[33][34][35][36][37] and chemical vapor deposition (CVD). [8,10,[38][39][40] For the vacuum-based deposition of copper or copper oxide films the precursors can be classified in two groups: Copper(I) and copper(II) compounds, respectively.…”
Section: Introductionmentioning
confidence: 99%