1989
DOI: 10.1524/zpch.1989.164.part_2.1171
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Cu Precipitations at the Surface of Crystalline Cu — Zr Alloys after Annealing in Hydrogen*

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Cited by 7 publications
(6 citation statements)
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“…The surface Cu-enrichment upon annealing in H 2 atmosphere of both amorphous and crystalline Zr-Cu alloys was previously reported and described [59,60]; the same underlying phenomenon occurs here in all likelihood. (ii) The second stage is the formation of zirconium hydride.…”
Section: Hydrogen-induced Disproportionationsupporting
confidence: 76%
“…The surface Cu-enrichment upon annealing in H 2 atmosphere of both amorphous and crystalline Zr-Cu alloys was previously reported and described [59,60]; the same underlying phenomenon occurs here in all likelihood. (ii) The second stage is the formation of zirconium hydride.…”
Section: Hydrogen-induced Disproportionationsupporting
confidence: 76%
“…19 Oxygen, either dissolved or present as a tertiary suboxide in Cu-rich alloys, also induces surface segregation of Zr with the formation of ZrO 2 when crystalline samples are annealed in ultrahigh vacuum. 20 Formation of zirconium oxide was similarly observed when a rapidly quenched amorphous Cu 30 Zr 70 alloy was exposed to CO 2 /H 2 or CO/H 2 reactant gas mixtures at 523 K. 10 Oxidation of Zr occurs despite a large excess of hydrogen, indicating that the zirconium component is highly reactive toward the carbon oxides. In sharp contrast, massive segregation of copper with the concomitant oxidation of zirconium was observed with the Cu 70 Zr 30 system.…”
Section: Discussionmentioning
confidence: 94%
“…Strong Cu segregation after annealing crystalline copper-rich alloys in hydrogen was reported. 20 No significant change in surface composition was measured, however, when amorphous Cu 30 Zr 70 and crystalline Cu 30 Zr 70 and Cu 70 Zr 30 were treated with hydrogen (473 K, 16 h). 21 In contrast, a thick Cu-enriched layer was formed at the surface of the amorphous Cu 70 Zr 30 alloy ribbon upon the same hydrogen treatment.…”
Section: Discussionmentioning
confidence: 95%
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