Abstract:The aim of our experiments is to improve the performance of Cd-free ZnO/Cu(InGa)Se 2 solar cells using a high-resistivity ZnO buffer layer. Buffer layers were deposited by atomic layer deposition (ALD) using diethylzinc (DEZn) and H 2 O as reactant gases. The structural and electrical properties of the ZnO films on glass substrates were characterized. A high resistivity of more than 10 3 ·cm and a transmittance of above 80% in the visible range were obtained. We focused on determining the optimum deposition pa… Show more
“…The addition of a ZnO HRT buffer layer has been shown to be beneficial to CdS/CdTe solar cell efficiency [19]. ZnO has also been used as a HRT buffer layer in Cu(InGa)Se2 (CIGS) solar cell devices [20].…”
Section: High Resistance Transparent (Hrt) Buffer Layersmentioning
Thin film photovoltaic devices are multilayer opto-electrical structures in which light interference occurs. Light reflection at the interfaces and absorption within the window layers reduces transmission and, ultimately, the conversion efficiency of photovoltaic devices. Optical reflection losses can be reduced by adjusting the layer thicknesses to achieve destructive interference within the structure of the cell. The light transmission to the CdTe absorber of a CdS/CdTe cell on a fluorine doped tin oxide transparent conductor has been modeled using the transfer matrix method. The interference effect in the CdS layer and high resistance transparent buffer layers (SnO2 and ZnO) has been investigated. The modeling shows that due to relatively high absorption within the SnO2 layer, there are modest benefits to engineering anti-reflection interference in the stack. However, a ZnO buffer layer has limited absorption and interference can be exploited to provide useful anti-reflection effects. Optical modeling and optimization shows that for a 50nm CdS layer, a maximum transmission of 78.5% is possible using ZnO as a buffer layer at 58nm thickness, and 78.0% for a SnO2 buffer layer at a thickness of 48nm.
“…The addition of a ZnO HRT buffer layer has been shown to be beneficial to CdS/CdTe solar cell efficiency [19]. ZnO has also been used as a HRT buffer layer in Cu(InGa)Se2 (CIGS) solar cell devices [20].…”
Section: High Resistance Transparent (Hrt) Buffer Layersmentioning
Thin film photovoltaic devices are multilayer opto-electrical structures in which light interference occurs. Light reflection at the interfaces and absorption within the window layers reduces transmission and, ultimately, the conversion efficiency of photovoltaic devices. Optical reflection losses can be reduced by adjusting the layer thicknesses to achieve destructive interference within the structure of the cell. The light transmission to the CdTe absorber of a CdS/CdTe cell on a fluorine doped tin oxide transparent conductor has been modeled using the transfer matrix method. The interference effect in the CdS layer and high resistance transparent buffer layers (SnO2 and ZnO) has been investigated. The modeling shows that due to relatively high absorption within the SnO2 layer, there are modest benefits to engineering anti-reflection interference in the stack. However, a ZnO buffer layer has limited absorption and interference can be exploited to provide useful anti-reflection effects. Optical modeling and optimization shows that for a 50nm CdS layer, a maximum transmission of 78.5% is possible using ZnO as a buffer layer at 58nm thickness, and 78.0% for a SnO2 buffer layer at a thickness of 48nm.
“…[8]). ZnO based films [9,10,11,12,13,14] and In2S3 films [12,15,16,17,18,19] have been identified as most promis ing. A review of (ALD) buffer layers has been published by Harikos et al in 2005 [20].…”
Section: Ald For Solar Cell Manufacturingmentioning
Atomic layer deposition (ALD) is a thin film growth technology that is capable of depositing uniform and con formal films on complex, three-dimensional objects with atomic precision. ALD is a rapidly growing field and it is currently at the verge of being introduced in the semicon ductor industry. Recently it has been recognized that the method has also applications in many other areas relying on thin films including the area of photovoltaics. In this contribution the basics and key features of the ALD method will be described focusing especially on the poten tial of the method in solar cell manufacturing. It will be shown that the method is of relevance for first, second and third generation solar cells.
“…To complete the cell fabrication process, a ZnO window layer was grown by the metal-organic chemical vapor deposition (MOCVD) process [7]. The efficiency of solar cells with an as-grown CBD-ZnO was about 9%.…”
Section: Application Of Cbd-zno As a Buffer Layer For Cigsse Solar Cellsmentioning
confidence: 99%
“…Furthermore, Nakada and Mizutani [5] reported a highly efficient CIGS solar cell by using a ZnS(O,OH) buffer layer. Up to now, our group also proposed several wide band gap Cd-free buffer layers, such as ZnInSe [6], ALD-ZnO [7], and In(OH) 3 :Zn 2+ [8].…”
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