2016
DOI: 10.1166/jnn.2016.13595
|View full text |Cite
|
Sign up to set email alerts
|

Crystallization Process of Silicon Thin Films with Carbon Nanotube Electron Beam (C-Beam)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2017
2017
2019
2019

Publication Types

Select...
3
1

Relationship

1
3

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 0 publications
0
1
0
Order By: Relevance
“…However, for high-power devices, many challenges should be overcome with the cold cathode electron source. For the market penetration of high-power devices such as X-ray lamps, [6][7][8][9][10][11] the structure modification process, [12][13][14] visible lightbulb, 15,16) micro-columns 17) and UV lamps, 18,19) we need a triode structure [20][21][22][23] electron beam with CNT emitters as the electron sources. The cold cathode electron beam requires an electron extraction gate mesh electrode.…”
Section: Introductionmentioning
confidence: 99%
“…However, for high-power devices, many challenges should be overcome with the cold cathode electron source. For the market penetration of high-power devices such as X-ray lamps, [6][7][8][9][10][11] the structure modification process, [12][13][14] visible lightbulb, 15,16) micro-columns 17) and UV lamps, 18,19) we need a triode structure [20][21][22][23] electron beam with CNT emitters as the electron sources. The cold cathode electron beam requires an electron extraction gate mesh electrode.…”
Section: Introductionmentioning
confidence: 99%