Abstract:Hydrogenated amorphous silicon (a-Si:H) films were deposited using the plasma-enhanced chemical vapor deposition (PECVD) process on Corning glass substrates. An aluminum overcoat was deposited on the films. The specimens were irradiated with a continuous wave Ar + laser beam of varying power density and duration. The samples were then annealed at 250 oC for 15 minutes to convert the amorphous silicon into polysilicon film. The grain size of the polycrystalline silicon films varies by varying the laser power de… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.